Effects of CO2 laser conditioning of the antireflection Y 2O3/SiO2 coatings at 351 nm

Optics Communications

Volumn 252, Issue 4-6, 2005, Pages 336-343

  Wei, Chaoyang ^a,b   He, Hongbo ^a   Shao, Jianda ^a   Wang, Tao ^a,b   Zhang, Dongping ^a,b   Fan, Zhengxiu ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Laser conditioning; Laser induced damage threshold; Optical coatings

Indexed keywords

ANTIREFLECTION COATINGS; CARBON DIOXIDE LASERS; CONTINUOUS WAVE LASERS; ELECTRON BEAMS; FUSED SILICA; LIGHT ABSORPTION; SILICA; YTTRIUM COMPOUNDS;

DEFECT DENSITY; ELECTRON BEAM EVAPORATION; LASER CONDITIONING; LASER-INDUCED DAMAGE THRESHOLD (LIDT);

LASER DAMAGE;

EID: 22544458219     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2005.04.051     Document Type: Article

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