Solvent-assisted growth of metal phthalocyanine thin films on Au(111)

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 3, 2012, Pages

  Tskipuri, Levan ^a   Shao, Qian ^a   Reutt Robey, Janice ^a  

^a University of Maryland   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AROMATIC SOLVENT; AU(1 1 1 ); AU(111) SURFACES; FILM MORPHOLOGY; IN-SITU; LONG RESIDENCE TIME; LONG-RANGE ORDERING; METALPHTHALOCYANINES; MOLECULAR BEAM DEPOSITION; MONOLAYER FILM; NANO-CAVITIES; NUCLEATION AND GROWTH; PHTHALOCYANINE FILMS; RESIDENCE TIME; SUBMONOLAYER COVERAGE; ULTRAHIGH VACUUM SCANNING TUNNELING MICROSCOPIES;

AMORPHOUS ALLOYS; ATMOSPHERIC AEROSOLS; CHEMICAL MODIFICATION; FILM GROWTH; NITROGEN COMPOUNDS; ORGANIC SOLVENTS; SCANNING TUNNELING MICROSCOPY; THIN FILMS; VACANCIES; VAPORS;

GOLD;

EID: 84864211032     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4705511     Document Type: Article

References (33)

1. A. Huebler, Org. Electron. 8, 480 (2007). 10.1016/j.orgel.2007.02.009
2. S. Shaheen, R. Radspinner, N. Peyghambarian, and G. Jabbour, Appl. Phys. Lett. 79, 2996 (2001). 10.1063/1.1413501
3. T. Yamada, H. Shinohara, T. Kamikado, and S. Mashiko, Jpn. J. Appl. Phys. 47, 1408 (2008). 10.1143/JJAP.47.1408
4. T. Yamada, H. Shinohara, G. Maofa, K. Kimura, and S. Mashiko, Thin Solid Films 438-439, 7 (2003). 10.1016/S0040-6090(03)00742-9
5. H. Chong, W. T. Nichols, D. T. O'Brien, M. F. Becker, D. Kovar, and J. W. Keto, J. Appl. Phys. 101, 064902 (2007) 10.1063/1.2710304.
6. H. Suzuki, T. Yamada, T. Kamikado, Y. Okuno, and S. Mashiko, J. Phys. Chem. B 109, 13296 (2005). 10.1021/jp051388t
7. T. Yamada, H. Suzuki, H. Miki, G. Maofa, and S. Mashiko, J. Phys. Chem. B 109, 3183 (2005). 10.1021/jp046389k
8. R. Green, A. Morfa, A. Ferguson, N. Kopidakis, G. Rumbles, and S. Shaheen, Appl. Phys. Lett. 92, 033301 (2008). 10.1063/1.2836267
9. C. Chan, Appl. Phys. Lett. 96, 133304 (2010). 10.1063/1.3360230
10. S. F. Tedde, J. Kern, T. Sterzl, J. Furst, P. Lugli, and O. Hayden, Nano Lett. 9, 980 (2009). 10.1021/nl803386y
11. C. N. Hoth, R. Steim, P. Schilinsky, S. A. Choulis, S. F. Tedde, O. Hayden, and C. J. Brabec, Org. Electron. 10, 587 (2009). 10.1016/j.orgel.2009. 02.010
12. M. Toader and M. Hietschold, J. Phys. Chem. C 115, 12494 (2011). 10.1021/jp201933s
13. J. Mao, H. Zhang, Y. Jiang, Y. Pan, M. Gao, W. Xiao, and H.-J. Gao, J. Am. Chem. Soc. 131, 14136 (2009). 10.1021/ja904907z
14. Z. H. Cheng, L. Gao, Z. T. Deng, Q. Liu, N. Jiang, X. Lin, X. B. He, S. X. Du, and H.-J. Gao, J. Phys. Chem. C 111, 2656 (2007). 10.1021/jp0660738
15. L. Gao, Phys. Rev. Lett. 99, 106402 (2007). 10.1103/PhysRevLett.99.106402
16. Y. Wei and J. E. Reutt-Robey, J. Am. Chem. Soc. 133, 15232 (2011). 10.1021/ja206175c
17. J. C. Buchholz and G. A. Somorjai, J. Chem. Phys. 66, 573 (1977). 10.1063/1.433979
18. K. Hipps, L. Scudiero, D. E. Barlow, and M. P. Cooke, Jr., J. Am. Chem. Soc. 124, 2126 (2002). 10.1021/ja017561q
19. A. Calzolari, W. Jin, J. E. Reutt-Robey, and M. Buongiorno Nardelli, J. Phys. Chem. C 114, 1041 (2010). 10.1021/jp908166j
20. X. Xiao, Z. Wang, Z. Hu, and T. He, J. Phys. Chem. B 114, 7452 (2010). 10.1021/jp911525d
21. J. Heyraud and J. Mtois, Surf. Sci. 100, 519 (1980). 10.1016/0039- 6028(80)90419-7
22. L. D. Marks, V. Heine, and D. J. Smith, Phys. Rev. Lett. 52, 656 (1984). 10.1103/PhysRevLett.52.656
23. J. V. Barth, H. Brune, G. Ertl, and R. J. Behm, Phys. Rev. B 42, 9307 (1990). 10.1103/PhysRevB.42.9307
24. Z. T. Deng, H. M. Guo, W. Guo, L. Gao, Z. H. Cheng, D. X. Shi, and H.-J. Gao, J. Phys. Chem. C 113, 11223 (2009). 10.1021/jp901193h
25. P. Linstrom and E. W. G. Mallard, NIST chemistry webbook., http://webbook.nist.gov.
26. M. S. Westwell, M. S. Searle, D. J. Wales, and D. H. Williams, J. Am. Chem. Soc. 117, 5013 (1995). 10.1021/ja00123a001
27. S. Guo and S. A. Kandel, J. Chem. Phys. 128, 014702 (2008) 10.1063/1.2819237.
28. J. Casadot, T. M. Pappenfus, L. L. Miller, K. R. Mann, E. Ort, P. M. Viruela, R. Pou-Amerigo, V. Hernandez, and J. T. Lopez Navarrete, J. Am. Chem. Soc. 125, 2524 (2003). 10.1021/ja027835p
29. N. Jiang, Y. Y. Zhang, Q. Liu, Z. H. Cheng, Z. T. Deng, S. X. Du, H.-J. Gao, M. J. Beck, and S. T. Pantelides, Nano Lett. 10, 1184 (2010). 10.1021/nl903473p
30. Q. Liu, Y. Y. Zhang, N. Jiang, H. G. Zhang, L. Gao, S. X. Du, and H.-J. Gao, Phys. Rev. Lett. 104, 166101 (2010). 10.1103/PhysRevLett.104.166101
31. S. Dick, H. Peisert, D. Dini, M. Hanack, M. Cook, I. Chambrier, and T. Chass, J. Appl. Phys. 97, 1 (2005). 10.1063/1.1875739
32. L. Gao, Phys. Rev. Lett. 101, 197209 (2008). 10.1103/PhysRevLett.101. 197209
33. S. Yoshimoto, E. Tsutsumi, K. Suto, Y. Honda, and K. Itaya, Chem. Phys. 319, 147 (2005). 10.1016/j.chemphys.2005.04.038