Thickness dependent surface microstructure evolution of bismuth thin film prepared by molecular beam deposition method

Current Applied Physics

Volumn 12, Issue 6, 2012, Pages 1518-1522

  Ahn, Youngkun ^a   Kim, Young Hwan ^a   Kim, Seong Il ^a   Jeong, Kwang Ho ^b  

^a Korea Institute of Science and Technology   (South Korea)

^b Yonsei University   (South Korea)

Author keywords

Bismuth thin film; Evolutionary selection model; Molecular beam deposition; Thickness dependent surface microstructure evolution

Indexed keywords

4-POINT PROBE; AFM; BISMUTH FILM; BISMUTH THIN FILMS; ELECTRICAL SHEET RESISTANCE; EVOLUTIONARY SELECTION; HORIZONTAL PROFILE; MOLECULAR BEAM DEPOSITION; SURFACE AREA; SURFACE MICROSTRUCTURES; XRD;

BISMUTH; CHEMICAL MODIFICATION; ELECTRIC PROPERTIES; MICROSTRUCTURE; MODELS; MOLECULAR BEAMS; POWER SPECTRAL DENSITY; SURFACE ROUGHNESS; THIN FILMS;

FILM THICKNESS;

EID: 84863984241     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2012.04.031     Document Type: Article

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