NbC/Si multilayer mirror for next generation EUV light sources

Optics Express

Volumn 20, Issue 14, 2012, Pages 15114-15120

  Modi, Mohammed H ^a   Rai, S K ^a   Idir, Mourad ^b   Schaefers, F ^c   Lodha, G S ^a  

^a RAJA RAMANNA CENTRE FOR ADVANCED TECHNOLOGY   (India)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

^c HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARBIDES; LIGHT SOURCES; MIRRORS; NIOBIUM; NIOBIUM COMPOUNDS; NOBELIUM; REFLECTION; SILICIDES;

ANNEALING EXPERIMENTS; CHEMICAL SPECIES; EUV LIGHT SOURCES; GRAZING INCIDENCE X-RAY DIFFRACTION; ION-BEAM SPUTTERING; MULTI-LAYER MIRRORS; MULTILAYER STRUCTURES; NIOBIUM CARBIDE; PERIOD LENGTH; SILICIDE FORMATION; SILICON LAYER; SOFT-X-RAY REFLECTIVITY; SPACER LAYER; SYNCHROTRON RADIATION SOURCE; WAVELENGTH REGIONS;

MULTILAYERS;

EID: 84863741480     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.20.015114     Document Type: Article

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