Influences of deposition parameters on microcrystalline silicon single junction cell efficiency in large- area and high rate deposition

International Journal of Precision Engineering and Manufacturing

Volumn 13, Issue 7, 2012, Pages 1113-1116

  Hwang, Doo Sup ^a   Lee, Cheong Hoon ^a   Lee, Jun Oh ^a   Jeon, Chang Yeop ^a   Lim, You Bong ^a   Chang, Cheol Jong ^a   Chang, Woo Sok ^a  

^a LG Electronics Inc   (South Korea)

Author keywords

High deposition rate; Large area deposition; Microcrystalline silicon; Single junction cell efficiency

Indexed keywords

COOLING SYSTEMS; DEPOSITION RATES; EFFICIENCY; ELECTRODES; ENTERTAINMENT INDUSTRY; FILM GROWTH; METALLIC FILMS; MICROCRYSTALLINE SILICON; MICROCRYSTALS; THERMOCOUPLES; THERMOELECTRIC EQUIPMENT; THIN FILM SOLAR CELLS; THIN FILMS;

HIGH DEPOSITION RATES; LARGE-AREA DEPOSITION; LIQUID COOLING SYSTEMS; MICROCRYSTALLINE FILMS; MICROCRYSTALLINE SILICON FILMS; PLASMA EXCITATION FREQUENCIES; SILICON THIN-FILM SOLAR CELLS; SINGLE-JUNCTION CELLS;

SUBSTRATES;

EID: 84863714174     PISSN: 12298557     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12541-012-0146-8     Document Type: Article

References (12)

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