Angular emission of ions and mass deposition from femtosecond and nanosecond laser-produced plasmas

Journal of Applied Physics

Volumn 111, Issue 12, 2012, Pages

  Verhoff, B ^a   Harilal, S S ^a   Hassanein, A ^a  

^a PURDUE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

1064 NM; ALUMINUM TARGET; ANGULAR EMISSION; ENERGY DISTRIBUTIONS; FARADAY CUPS; FEMTOSECONDS; FS LASER; IN-VACUUM; ION EMISSIONS; ION FLUXES; KINETIC ENERGY DISTRIBUTIONS; LASER FLUENCES; LASER PLASMA; MASS DEPOSITION; METAL PLASMA; ND : YAG LASERS; QUARTZ MICROBALANCE; TI:SAPPHIRE;

ANGULAR DISTRIBUTION; ELECTRIC POWER DISTRIBUTION; IONS; KINETIC ENERGY; KINETICS; LASER BEAMS; LASER PRODUCED PLASMAS; PLASMA INTERACTIONS; SAPPHIRE; ULTRAFAST LASERS;

NEODYMIUM LASERS;

EID: 84863522276     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4730444     Document Type: Article

References (35)

1. J. F. Ready, Industrial Applications of Lasers, 2nd ed. (Academic Press, San Diego, 1997).
2. G. Cerullo, R. Osellame, S. Taccheo, M. Marangoni, D. Polli, R. Ramponi, P. Laporta, and S. De Silvestri, Opt. Lett. 27, 1938 (2002). 10.1364/OL.27.001938
3. R. M. Kurtz, J. A. Squier, V. M. Elner, D. Du, X. B. Liu, A. Sugar, and G. A. Mourou, Investigative Ophthalmology Visual Sci. 35, 1786 (1994).
4. N. H. Rizvi, RIKEN Rev. 50, 107 (2003).
5. S. Amoruso, T. Donnelly, J. G. Lunney, R. Bruzzese, X. Wang, and X. Ni, Appl. Phys. A 100, 569 (2010). 10.1007/s00339-010-5877-8
6. B. X. Hou, J. Nees, J. Easter, J. Davis, G. Petrov, A. Thomas, and K. Krushelnick, Appl. Phys. Lett. 95, 101503 (2009). 10.1063/1.3224180
7. T. Donnelly, J. G. Lunney, S. Amoruso, R. Bruzzese, X. Wang, and X. Ni, J. Appl. Phys. 108, 043309 (2010). 10.1063/1.3475149
8. J. Badziak, A. A. Kozlov, J. Makowski, P. Parys, L. Ryc, J. Wolowski, E. Woryna, and A. B. Vankov, Laser Particle Beams 17, 323 (1999). 10.1017/S0263034699172197
9. E. G. Gamaly, A. V. Rode, B. Luther-Davies, and V. T. Tikhonchuk, Phys. Plasmas 9, 949 (2002). 10.1063/1.1447555
10. Y. Hirayama and M. Obara, J. Appl. Phys. 97, 064903 (2005). 10.1063/1.1852692
11. R. C. Issac, G. Vieux, B. Ersfeld, E. Brunetti, S. P. Jamison, J. Gallacher, D. Clark, and D. A. Jaroszynski, Phys. Plasmas 11, 3491 (2004). 10.1063/1.1755222
12. K. Krushelnick, E. L. Clark, R. Allott, F. N. Beg, C. N. Danson, A. Machacek, V. Malka, Z. Najmudin, D. Neely, P. A. Norreys, M. R. Salvati, M. I. K. Santala, M. Tatarakis, I. Watts, M. Zepf, and A. E. Dangor, IEEE Trans. Plasma Sci. 28, 1184 (2000). 10.1109/27.893296
13. A. Hassanein, T. Sizyuk, V. Sizyuk, and S. S. Harilal, J. Micro/Nanolith. MEMS MOEMS 10, 033002 (2011). 10.1117/1.3609043
14. M. E. Povarnitsyn, T. E. Itina, M. Sentis, K. V. Khishchenko, and P. R. Levashov, Phys. Rev. B 75, 235414 (2007). 10.1103/PhysRevB.75.235414
15. A. H. Dogar, B. Ilyas, H. Qayyum, S. Ullah, and A. Qayyum, Eur. Phys. J. Appl. Phys. 54, 10301 (2011). 10.1051/epjap/2011100211
16. J. Koch, A. von Bohlen, R. Hergenroder, and K. Niemax, J. Anal. Atomic Spectr. 19, 267 (2004). 10.1039/b310512a
17. S. Canulescu, E. Papadopoulou, D. Anglos, T. Lippert, M. J. Montenegro, S. Georgiou, M. Dobeli, and A. Wokaun, Appl. Phys. A 105, 167 (2011). 10.1007/s00339-011-6463-4
18. S. Yalcin, Y. Y. Tsui, and R. Fedosejevs, J. Anal. Atomic Spectr. 19, 1295 (2004). 10.1039/b404132a
19. R. Janmohamed, G. Redman, and Y. Y. Tsui, IEEE Trans. Plasma Sci. 34, 455 (2006). 10.1109/TPS.2006.872459
20. J. Yoo and H. S. Lim, J. Mech. Sci. Technol. 25, 1811 (2011). 10.1007/s12206-011-0511-z
21. J. J. Chang and B. E. Warner, Appl. Phys. Lett. 69, 473 (1996). 10.1063/1.118144
22. C. R. Phipps, Laser Ablation and Its Applications (Springer, New York, 2007).
23. G. O. Williams, S. Favre, and G. M. O'Connor, Appl. Phys. Lett. 94, 101503 (2009). 10.1063/1.3095851
24. S. Amoruso, X. Wang, C. Altucci, C. de Lisio, M. Armenante, R. Bruzzese, and R. Velotta, Appl. Phys. Lett. 77, 3728 (2000). 10.1063/1.1329869
25. G. O. Williams, G. M. O'Connor, P. T. Mannion, and T. J. Glynn, Appl. Surf. Sci. 254, 5921 (2008). 10.1016/j.apsusc.2008.03.192
26. Z. Zhang, P. A. VanRompay, J. A. Nees, and P. P. Pronko, J. Appl. Phys. 92, 2867 (2002). 10.1063/1.1497449
27. S. Amoruso, X. Wang, C. Altucci, C. de Lisio, M. Armenante, R. Bruzzese, N. Spinelli, and R. Velotta, Appl. Surf. Sci. 186, 358 (2002). 10.1016/S0169-4332(01)00679-1
28. P. A. VanRompay, M. Nantel, and P. P. Pronko, Surf. Coat. Technol. 100, 496 (1998). 10.1016/S0257-8972(97)00678-6
29. M. Q. Ye and C. P. Grigoropoulos, J. Appl. Phys. 89, 5183 (2001). 10.1063/1.1360696
30. E. G. Gamaly, A. V. Rode, V. T. Tikhonchuk, and B. Luther-Davies, Appl. Surf. Sci. 197, 699 (2002). 10.1016/S0169-4332(02)00396-3
31. S. S. Harilal, B. O'Shay, Y. Tao, and M. S. Tillack, Appl. Phys. B 86, 547 (2007). 10.1007/s00340-006-2532-3
32. F. Castano, P. Ecija, J. I. Apinaniz, R. Martinez, F. J. Basterretxea, A. Longarte, C. Redondo, and M. N. S. Rayo, Chem. Phys. Lett. 486, 60 (2010). 10.1016/j.cplett.2009.12.062
33. F. Castano, J. I. Apinaniz, B. Sierra, R. Martinez, A. Longarte, and C. Redondo, J. Phys. Chem. C 112, 16556 (2008). 10.1021/jp805610h
34. S. N. Srivastava, K. Rohr, and B. K. Sinha, J. Appl. Phys. 99, 07330 (2006).
35. T. Sizyuk and A. Hassanein, J. Nucl. Mater. 404, 60 (2010). 10.1016/j.jnucmat.2010.06.031