Pressure dependence of emission intensity in femtosecond laser-induced breakdown spectroscopy

Journal of Analytical Atomic Spectrometry

Volumn 19, Issue 10, 2004, Pages 1295-1301

  Yalçin, Şerife ^a   Tsui, Ying Y ^a   Fedosejevs, Robert ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CHARGE COUPLED DEVICES; COPPER; ELECTROMAGNETIC WAVE EMISSION; ELECTROMAGNETIC WAVE INTERFERENCE; IONIZATION; LASER APPLICATIONS; LASER BEAMS; LASER PRODUCED PLASMAS; LASER PULSES; SIGNAL TO NOISE RATIO; SILICON;

EMISSION INTENSITY; IMAGING OPTICS; LASER INDUCED BREAKDOWN SPECTROSCOPY (LIBW); PLASMA EMISSIONS;

SPECTROSCOPIC ANALYSIS;

EID: 17044428590     PISSN: 02679477     EISSN: None     Source Type: Journal    
DOI: 10.1039/b404132a     Document Type: Article

References (27)

1. B. Le Drogoff, F. Vidal, Y. von Kaenel, M. Chaker, T. W. Johnston, S. Laville, M. Sabsabi and J. Margot, Spectrochim. Acta, Part B, 2001, 56, 987-1002.
2. V. Margetic, A. Pakulev, A. Stockhaus, M. Bolshov, K. Niemax and R. Hergenröder, Spectrochim. Acta, Part B, 2000, 55, 1771-1785.
3. V. Margetic, K. Niemax and R. Hergenröder, Spectrochim. Acta, Part B, 2001, 56, 1003-1010.
4. V. Margetic, M. Bolshov, A. Stockhaus, K. Niemax and R. Hergenröder, J. Anal At. Spectrom., 2001, 16, 616-621.
5. K. L. Eland, D. N. Stratis, D. M. Gold, S. R. Goode and S. M. Angel, Appl. Spectrosc., 2001, 55, 286-291.
6. C. Liu, X. L. Mao, S. S. Mao, X. Zeng, R. Grief and R. E. Russo, Anal. Chem., 2004, 76, 379-383.
7. R. E. Russo, X. L. Mao, J. J. Gonzales and S. S. Mao, J. Anal. At. Spectrom., 2002, 17, 1072-1075.
8. F. Korte, J. Serbin, J. Koch, A. Egbert, C. Fallnich, A. Ostendorf and B. N. Chichkov, Appl. Phys. A, 2003, 77, 229-235.
9. B. N. Chichkov, C. Momma, S. Nolte, F. von Alvensleberi and A. Tünnermann, Appl. Phys. A, 1996, 63, 109-115.
10. S. Korte, S. Adams, A. Egbert, C. Fallnich, A. Ostendorf, S. Nolte, M. Will, J.-P. Ruske, B. N. Chichkov and A. Tünnermann, Opt. Express, 2000, 7, 41-49.
11. N. Barsch, K. Korber, A. Ostendorf and K. H. Tonshoff, Appl. Phys. A, 2003, 77, 237-242.
12. A. Vierheilig, T. Chen, P. Waltner, W. Kiefer, A. Materny and A. H. Zewail, Chem. Phys. Lett., 1999, 312, 349-356.
13. K. Ozono and M. Obara, Appl. Phys. A, 2003, 77, 303-306.
14. C. Geertsen, J.-L. Lacour, P. Mauchien and L. Pierrard, Spectrochim. Acta, Part B, 1996, 51, 1403-1416.
15. G. W. Rieger, M. Taschuk, Y. Y. Tsui and R. Fedosejevs, Appl. Spectrosc, 2002, 56, 689-698.
16. I. V. Cravetchi, M. Taschuk, G. W. Rieger, Ying Y. Tsui and R. Fedosejevs, Appl. Opt., 2003, 42, 6138-6147.
17. G. W. Rieger, M. Taschuk, Y. Y. Tsui and R. Fedosejevs, Spectrochim. Acta, Part B, 2003, 58, 497-510.
18. X. L. Mao, W. T. Chan, M. A. Shannon and R. E. Russo, J. Appl. Phys., 1993, 74(8), 4915-4922.
19. S. Yalcin, D. R. Crosley, G. P. Smith and G. W. Faris, Appl. Phys. B, 1999, 68, 121-130.
20. K. Kagawa and S. Yokoi, Spectrochim. Acta, Part B, 1982, 37(9), 789-795.
21. I. Lee, T. L. Thiem, G.H. Kim, Y. Y. Teng and J. Sneddon, Appl. Spectrosc, 1992, 46, 1597-1604.
22. I. Lee, K. Song, H. K. Cha, J.-M. Lee, M.-C. Park, G.-H. Lee and J. Sneddon, Appl. Spectrosc, 1997, 51, 959-964.
23. F. Lu, Z. B. Tao and M. H. Hong, Jpn. J. Appl. Phys., 1999, 38, 2958-2963.
24. K. Knight, N. L. Scherbarth, D. A. Cremers and M. J. Ferris, Appl. Spectrosc, 2000, 54, 331-340.
25. R. Brennetot, J. L. Lacour, E. Vors, A. Rivoallan, D. Vailhen and S. Maurice, Appl. Spertrosc., 2003, 57(7), 744-752.
26. R. Griem, in Principles of Plasma Spectroscopy, University Press, Cambridge, 1997, pp. 244-257.
27. G. Root, in Laser Induced Plasmas and Applications, ed. L. J. Radziemski and D. A. Cremers, Marcel Dekker, New York, 1989, pp. 69-103.