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Volumn , Issue , 2011, Pages

Physical mechanisms of endurance degradation in TMO-RRAM

Author keywords

[No Author keywords available]

Indexed keywords

FAILURE BEHAVIORS; PHYSICAL MECHANISM; SWITCHING CYCLES; SWITCHING MODES;

EID: 84863073355     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.2011.6131539     Document Type: Conference Paper
Times cited : (109)

References (8)
  • 3
    • 79951815188 scopus 로고    scopus 로고
    • High performance ultra-low energy RRAM with good retention and endurance
    • C. H. Cheng, C. Y. Tsai, A. Chin, and F. S. Yeh, "High performance ultra-low energy RRAM with good retention and endurance" IEDM Tech. Dig, p448, 2010.
    • (2010) IEDM Tech. Dig , pp. 448
    • Cheng, C.H.1    Tsai, C.Y.2    Chin, A.3    Yeh, F.S.4
  • 5
    • 79951950366 scopus 로고    scopus 로고
    • A Novel Operation Scheme for Oxide-Based Resistive-Switching Memory Devices to Achieve Controlled Switching Behaviors
    • B. Chen, B. Gao, S. W. Sheng, L. F. Liu, X. Y. Liu, Y. S. Chen, Y. Wang, R. Q. Han, B. Yu, and J. F. Kang, "A Novel Operation Scheme for Oxide-Based Resistive-Switching Memory Devices to Achieve Controlled Switching Behaviors" IEEE EDL, vol.32, p282, 2011;
    • (2011) IEEE EDL , vol.32 , pp. 282
    • Chen, B.1    Gao, B.2    Sheng, S.W.3    Liu, L.F.4    Liu, X.Y.5    Chen, Y.S.6    Wang, Y.7    Han, R.Q.8    Yu, B.9    Kang, J.F.10
  • 6
    • 79953059793 scopus 로고    scopus 로고
    • HfOx/TiOx/HfOx/TiOx Multilayer-Based Forming-Free RRAM Devices with Excellent Uniformity
    • Z. Fang, H. Y. Yu, X. Li, N. Singh, G. Q. Lo, and D. L. Kwong, "HfOx/TiOx/HfOx/TiOx Multilayer-Based Forming-Free RRAM Devices With Excellent Uniformity" IEEE EDL, vol.32, p566, 2011
    • (2011) IEEE EDL , vol.32 , pp. 566
    • Fang, Z.1    Yu, H.Y.2    Li, X.3    Singh, N.4    Lo, G.Q.5    Kwong, D.L.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.