Epitaxial insertion of gold silicide nanodisks during the growth of silicon nanowires

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 7, 2011, Pages 6118-6121

  Um, Han Don ^a   Jee, Sang Won ^a   Park, Kwang Tae ^a   Jung, Jin Young ^a   Guo, Zhongyi ^a   Lee, Jung Ho ^a  

^a Hanyang University   (South Korea)

Author keywords

Au Si Heterostructure; Gold Silicide; Nanodisk; Si Nanowire

Indexed keywords

ATOMIC RATIO; ELECTRICAL JUNCTIONS; EPITAXIALLY GROWN; FUTURE APPLICATIONS; GOLD SILICIDE; GROWTH DIRECTIONS; LIQUID ALLOY; NANO-SIZED; NANODISK; NANODISKS; SI NANOWIRE; SILICON NANOWIRES; SOURCE GAS; SUPERSATURATED SOLUTIONS; VAPOR-LIQUID-SOLID GROWTH;

CHLORINE; EPITAXIAL GROWTH; GOLD; HETEROJUNCTIONS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; HYDROGEN; LIQUIDS; NANOWIRES; PHASE INTERFACES; PRECIPITATION (CHEMICAL); SILICIDES; SILICON; VAPORS;

SILICON ALLOYS;

EID: 84863025407     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.4474     Document Type: Conference Paper

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