Impedance behaviour of anodic TiO 2 films prepared by galvanostatic anodisation and powerful pulsed discharge in electrolyte

Electrochimica Acta

Volumn 76, Issue , 2012, Pages 453-461

  Poznyak, S K ^a,b   Lisenkov, A D ^a   Ferreira, M G S ^a   Kulak, A I ^c   Zheludkevich, M L ^a  

^a UNIVERSITY OF AVEIRO   (Portugal)

^b BELARUSIAN STATE UNIVERSITY   (Belarus)

^c INSTITUTE OF GENERAL AND INORGANIC CHEMISTRY   (Belarus)

Author keywords

Anodic films; EIS; Photocurrent; Pulsed discharge; Titanium dioxide

Indexed keywords

ACID ELECTROLYTES; ANODIC FILMS; ANODIC OXIDE FILM; ANODIC TITANIA FILM; ANODISATION; COMPACT LAYER; EIS; FILM STRUCTURE; GALVANOSTATIC METHODS; GALVANOSTATICS; HIGH RATE; IMPEDANCE SPECTRUM; LOW CONCENTRATIONS; MICROSCOPIC OBSERVATIONS; MOTT-SCHOTTKY PLOTS; NANO-POROUS; PHOTOCURRENT RESPONSE; PHOTOELECTROCHEMICAL MEASUREMENTS; PULSED DISCHARGE; SEMICONDUCTIVE PROPERTIES; SHORT WAVELENGTHS; SPACE CHARGE REGIONS; TIO; TWO-LAYER FILMS;

AMORPHOUS FILMS; ANODIC OXIDATION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROLYTES; FILM GROWTH; IONIZATION; METALLIC FILMS; OXIDE FILMS; PHOTOCURRENTS; SULFURIC ACID; TITANIUM DIOXIDE;

FILM PREPARATION;

EID: 84862993132     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2012.05.064     Document Type: Article

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