Selective reactions and adsorption structure of pyrazine on Si(100): HRPES and NEXAFS study

Journal of Physical Chemistry C

Volumn 116, Issue 1, 2012, Pages 722-725

  Lee, Han Koo ^a   Park, Jinwoo ^b   Kim, Ilyou ^c   Kim, Hyeong Do ^a,c   Park, Byeong Gyu ^a   Shin, Hyun Joon ^a,c   Lee, Ik Jae ^a   Singh, Abhinav Pratap ^a   Thakur, Anup ^a,d   Kim, J Y ^a,c  

^a POSTECH   (South Korea)

^b Sejong University   (South Korea)

^c Pohang University of Science and Technology (POSTECH)   (South Korea)

^d PUNJABI UNIVERSITY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION STRUCTURES; ANGULAR DEPENDENCE; CARBON K-EDGE; CORE-LEVEL SPECTRA; HIGH-RESOLUTION PHOTOEMISSION SPECTROSCOPY; NEAR EDGE X RAY ABSORPTION FINE STRUCTURE; ORBITALS; PARTIAL ELECTRON YIELDS; PYRAZINES; SELECTIVE REACTIONS; SI(1 0 0); SILICON SURFACES; TILT-ANGLE;

ADSORPTION; ATOMIC SPECTROSCOPY; CHEMISORPTION; DIMERS; PHOTOELECTRON SPECTROSCOPY;

SILICON;

EID: 84862908378     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp2078874     Document Type: Article

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