-
1
-
-
58149330219
-
Photobase generators: Recent progress and application trend in polymer systems
-
K. Suyama, and M. Shirai Photobase generators: recent progress and application trend in polymer systems Prog Polym Sci 34 2 2009 194 209
-
(2009)
Prog Polym Sci
, vol.34
, Issue.2
, pp. 194-209
-
-
Suyama, K.1
Shirai, M.2
-
2
-
-
0344253995
-
Photolithographic micropatterning of an electroluminescent polymer using photobase generator
-
S.K. Lee, B.J. Jung, T. Ahn, I. Song, and H.K. Shim Photolithographic micropatterning of an electroluminescent polymer using photobase generator Macromolecules 36 24 2003 9252 9256
-
(2003)
Macromolecules
, vol.36
, Issue.24
, pp. 9252-9256
-
-
Lee, S.K.1
Jung, B.J.2
Ahn, T.3
Song, I.4
Shim, H.K.5
-
3
-
-
84862861266
-
-
US Patent 6045, 977
-
Chandross EA, Houlihan FM, Partovi A, Quan XS, Venugopal G. Process for patterning conductive polyaniline films. US Patent 6045, 977; 2000.
-
(2000)
Process for Patterning Conductive Polyaniline Films
-
-
Chandross, E.A.1
Houlihan, F.M.2
Partovi, A.3
Quan, X.S.4
Venugopal, G.5
-
4
-
-
0011508796
-
Photoactivatable cross-linked polyacrylamide for the site-selective immobilization of antigens and antibodies
-
M.S. Sanford, P.T. Charles, S.M. Commisso, J.C. Roberts, and D.W. Conrad Photoactivatable cross-linked polyacrylamide for the site-selective immobilization of antigens and antibodies Chem Mater 10 6 1998 1510 1520
-
(1998)
Chem Mater
, vol.10
, Issue.6
, pp. 1510-1520
-
-
Sanford, M.S.1
Charles, P.T.2
Commisso, S.M.3
Roberts, J.C.4
Conrad, D.W.5
-
5
-
-
0037457839
-
Positive and negative tone protein patterning on a photobase generating polymer
-
J. Wright, E. Ivanova, D. Pham, L. Filipponi, A. Viezzoli, and K. Suyama Positive and negative tone protein patterning on a photobase generating polymer Langmuir 19 2 2003 446 452
-
(2003)
Langmuir
, vol.19
, Issue.2
, pp. 446-452
-
-
Wright, J.1
Ivanova, E.2
Pham, D.3
Filipponi, L.4
Viezzoli, A.5
Suyama, K.6
-
7
-
-
17244363133
-
Image recording material based on the polymeric photobase generator containing oxime-urethane groups
-
K.H. Chae, J.C. Gwark, and T. Chang Image recording material based on the polymeric photobase generator containing oxime-urethane groups Macromol Rapid Commun 21 15 2000 1007 1012
-
(2000)
Macromol Rapid Commun
, vol.21
, Issue.15
, pp. 1007-1012
-
-
Chae, K.H.1
Gwark, J.C.2
Chang, T.3
-
8
-
-
0037090109
-
Photochemical modification of polymer surface by the pendant photobase generator containing oxime-urethane groups and its application to an image-recording material
-
K.H. Chae, and H.J. Jang Photochemical modification of polymer surface by the pendant photobase generator containing oxime-urethane groups and its application to an image-recording material J Polym Sci Part A: Polym Chem 40 8 2002 1200 1207
-
(2002)
J Polym Sci Part A: Polym Chem
, vol.40
, Issue.8
, pp. 1200-1207
-
-
Chae, K.H.1
Jang, H.J.2
-
9
-
-
36849049709
-
Red-yellow fluorescence patterning of a polymer film containing phthalimido carbamate groups
-
K.H. Chae, and Y.H. Kim Red-yellow fluorescence patterning of a polymer film containing phthalimido carbamate groups Adv Funct Mater 17 17 2007 3470 3476
-
(2007)
Adv Funct Mater
, vol.17
, Issue.17
, pp. 3470-3476
-
-
Chae, K.H.1
Kim, Y.H.2
-
10
-
-
17244371187
-
Prefluorescent-dye-induced, chemically reversible fluorescent imaging based on a polymeric photobase generator
-
W.S. Choi, Y.Y. Noh, and K.H. Chae Prefluorescent-dye-induced, chemically reversible fluorescent imaging based on a polymeric photobase generator Adv Mater 17 7 2005 833 837
-
(2005)
Adv Mater
, vol.17
, Issue.7
, pp. 833-837
-
-
Choi, W.S.1
Noh, Y.Y.2
Chae, K.H.3
-
11
-
-
0042358801
-
Novel labile protected amine terpolymers for the preparation of patterned functionalized surfaces: Synthesis and characterization
-
F. Braun, L. Eng, S. Trogisch, and B. Voit Novel labile protected amine terpolymers for the preparation of patterned functionalized surfaces: synthesis and characterization Macromol Chem Phys 204 12 2003 1486 1496
-
(2003)
Macromol Chem Phys
, vol.204
, Issue.12
, pp. 1486-1496
-
-
Braun, F.1
Eng, L.2
Trogisch, S.3
Voit, B.4
-
12
-
-
0037126757
-
Classical metallocenes as photoinitiators for the anionic polymerization of an alkyl 2-cyanoacrylate
-
C.T. Sanderson, B.J. Palmer, A. Morgan, M. Murphy, R.A. Dluhy, and T. Mize Classical metallocenes as photoinitiators for the anionic polymerization of an alkyl 2-cyanoacrylate Macromolecules 35 26 2002 9648 9652
-
(2002)
Macromolecules
, vol.35
, Issue.26
, pp. 9648-9652
-
-
Sanderson, C.T.1
Palmer, B.J.2
Morgan, A.3
Murphy, M.4
Dluhy, R.A.5
Mize, T.6
-
13
-
-
58349084671
-
Photoinduced unzipping depolymerization of poly (olefin sulfone)s possessing photobase generator and base amplifier
-
T. Sasaki, and H. Yaguchi Photoinduced unzipping depolymerization of poly (olefin sulfone)s possessing photobase generator and base amplifier J Polym Sci Part A: Polym Chem 47 2 2009 602 613
-
(2009)
J Polym Sci Part A: Polym Chem
, vol.47
, Issue.2
, pp. 602-613
-
-
Sasaki, T.1
Yaguchi, H.2
-
14
-
-
0032326516
-
Thermal curing reaction of poly (glycidyl methacrylate) using photogenerated amines from oxime-urethane derivatives
-
K.H. Chae Thermal curing reaction of poly (glycidyl methacrylate) using photogenerated amines from oxime-urethane derivatives Macromol Rapid Commun 19 1 1998 1 4
-
(1998)
Macromol Rapid Commun
, vol.19
, Issue.1
, pp. 1-4
-
-
Chae, K.H.1
-
15
-
-
0001591795
-
Crosslinking reaction of glycidyl methacrylate copolymers containing oxime-urethane groups using photogenerated pendant amines
-
K.H. Chae, and H.B. Song Crosslinking reaction of glycidyl methacrylate copolymers containing oxime-urethane groups using photogenerated pendant amines Polym Bull 40 6 1998 667 674
-
(1998)
Polym Bull
, vol.40
, Issue.6
, pp. 667-674
-
-
Chae, K.H.1
Song, H.B.2
-
16
-
-
0001971411
-
Photolysis reaction mechanism of dibenzophenoneoxime hexamethylenediurethane, a new type of photobase generator
-
H. Hwang, D.-J. Jang, and K.H. Chae Photolysis reaction mechanism of dibenzophenoneoxime hexamethylenediurethane, a new type of photobase generator J Photochem Photobiol A: Chem 126 1-3 1999 37 42
-
(1999)
J Photochem Photobiol A: Chem
, vol.126
, Issue.13
, pp. 37-42
-
-
Hwang, H.1
Jang, D.-J.2
Chae, K.H.3
-
17
-
-
0033450691
-
A new photobase generator containing oxime-urethane group and its application
-
K.H. Chae, and D.-J. Jang A new photobase generator containing oxime-urethane group and its application Macromol Symp 142 1 1999 173 183
-
(1999)
Macromol Symp
, vol.142
, Issue.1
, pp. 173-183
-
-
Chae, K.H.1
Jang, D.-J.2
-
18
-
-
0034691491
-
Preparation and properties of epoxy copolymers containing oxime-urethane groups as photobase generators
-
K.H. Chae, H.B. Song, H.Y. Sun, and J.Y. Chang Preparation and properties of epoxy copolymers containing oxime-urethane groups as photobase generators Bull Korean Chem Soc 21 7 2000 690 696
-
(2000)
Bull Korean Chem Soc
, vol.21
, Issue.7
, pp. 690-696
-
-
Chae, K.H.1
Song, H.B.2
Sun, H.Y.3
Chang, J.Y.4
-
19
-
-
80052986655
-
One component photo-curing agent for epoxy resins based on multifunctional photobase generators containing oxime-urethane groups
-
K.H. Chae, C.S. Lee, and J.H. Kim One component photo-curing agent for epoxy resins based on multifunctional photobase generators containing oxime-urethane groups Polym Adv Technol 22 10 2011 1427 1433
-
(2011)
Polym Adv Technol
, vol.22
, Issue.10
, pp. 1427-1433
-
-
Chae, K.H.1
Lee, C.S.2
Kim, J.H.3
-
20
-
-
1342324950
-
A polymeric photobase generator containing oxime-urethane groups: Crosslinking reaction and application to negative photoresist
-
K.H. Chae, and K.H. Sung A polymeric photobase generator containing oxime-urethane groups: crosslinking reaction and application to negative photoresist J Polym Sci Part A: Polym Chem 42 4 2004 975 984
-
(2004)
J Polym Sci Part A: Polym Chem
, vol.42
, Issue.4
, pp. 975-984
-
-
Chae, K.H.1
Sung, K.H.2
-
21
-
-
4444282258
-
A one-component negative photoresist based on an epoxy terpolymer containing oxime-urethane groups as a photobase generator
-
K.H. Chae, and J.H. Park A one-component negative photoresist based on an epoxy terpolymer containing oxime-urethane groups as a photobase generator Macromol Res 12 4 2004 352 358
-
(2004)
Macromol Res
, vol.12
, Issue.4
, pp. 352-358
-
-
Chae, K.H.1
Park, J.H.2
-
22
-
-
33745872553
-
Positive-type photosensitive polyimide based on a photobase generator containing oxime-urethane groups as a photosensitive compound
-
Y.M. Jang, J.Y. Seo, K.H. Chae, and M.H. Yi Positive-type photosensitive polyimide based on a photobase generator containing oxime-urethane groups as a photosensitive compound Macromol Res 14 3 2006 300 305
-
(2006)
Macromol Res
, vol.14
, Issue.3
, pp. 300-305
-
-
Jang, Y.M.1
Seo, J.Y.2
Chae, K.H.3
Yi, M.H.4
-
23
-
-
33947093557
-
Phthalimido phenylcarbamate: A new isocyanate generator
-
K. Kurita, H. Imajo, and Y. Iwakura Phthalimido phenylcarbamate: a new isocyanate generator J Org Chem 43 14 1978 2918 2919
-
(1978)
J Org Chem
, vol.43
, Issue.14
, pp. 2918-2919
-
-
Kurita, K.1
Imajo, H.2
Iwakura, Y.3
-
24
-
-
0032712176
-
Photoresists with reduced environmental impact: Water-soluble resists based on photo-cross-linking of a sugar-containing polymethacrylate
-
J.M. Havard, N. Vladimirov, J.M. Frechet, S. Yamada, C. Willson, and J.D. Byers Photoresists with reduced environmental impact: water-soluble resists based on photo-cross-linking of a sugar-containing polymethacrylate Macromolecules 32 1 1999 86 94
-
(1999)
Macromolecules
, vol.32
, Issue.1
, pp. 86-94
-
-
Havard, J.M.1
Vladimirov, N.2
Frechet, J.M.3
Yamada, S.4
Willson, C.5
Byers, J.D.6
|