Improvement of sensing characteristics of radio-frequency sputtered tungsten oxide films through surface modification by laser irradiation

Materials Chemistry and Physics

Volumn 133, Issue 2-3, 2012, Pages 588-591

  Zhang, Chao ^a   Van Overschelde, Olivier ^a   Boudiba, Abdelhamid ^a   Snyders, Rony ^a,b   Olivier, Marie Georges ^a,b   Debliquy, Marc ^a  

^a UNIVERSITY OF MONS   (Belgium)

^b MATERIA NOVA RESEARCH CENTER   (Belgium)

Author keywords

A. Semiconductors; A. Thin films; B. Sputtering; D. Electrical conductivity

Indexed keywords

ELECTRICAL CONDUCTIVITY; FILM SURFACE MORPHOLOGY; LASER POWER DENSITY; LOW CONCENTRATION NO; RADIO FREQUENCIES; RADIO FREQUENCY SPUTTERING; SEMICONDUCTOR GAS SENSORS; SENSING CHARACTERISTICS; SENSING LAYERS; TUNGSTEN OXIDE; TUNGSTEN OXIDE FILMS;

ATOMIC FORCE MICROSCOPY; CHEMICAL SENSORS; ELECTRIC CONDUCTIVITY; EXCIMER LASERS; OXIDE FILMS; OXIDES; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION;

SPUTTERING;

EID: 84862804232     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2012.01.116     Document Type: Article

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