Different growth behaviors of ambient pressure chemical vapor deposition graphene on Ni(111) and Ni films: A scanning tunneling microscopy study

Nano Research

Volumn 5, Issue 6, 2012, Pages 402-411

  Zhang, Yanfeng ^a,b   Gao, Teng ^b   Xie, Shubao ^b   Dai, Boya ^b   Fu, Lei ^b   Gao, Yabo ^b   Chen, Yubin ^b   Liu, Mengxi ^b   Liu, Zhongfan ^b  

^a PEKING UNIVERSITY   (China)

^b PEKING UNIVERSITY   (China)

Author keywords

chemical vapor deposition; grain boundary; Graphene; nickel; scanning tunneling microscopy

Indexed keywords

EID: 84862665991     PISSN: 19980124     EISSN: 19980000     Source Type: Journal    
DOI: 10.1007/s12274-012-0221-6     Document Type: Article

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