SCOPUS 정보 검색 플랫폼

Volumn 22, Issue 25, 2012, Pages 12824-12829

Atomic layer deposition of germanium-doped zinc oxide films with tuneable ultraviolet emission

(8) Chalker, Paul R a Marshall, Paul A a King, Peter J a Dawson, Karl a Romani, Simon a Williams, Paul A b Ridealgh, John c Rosseinsky, Matthew J a

a UNIVERSITY OF LIVERPOOL (United Kingdom)

b SAFC (United Kingdom)

c Pilkington Group Limited (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOY FORMATION; CYCLIC PULSE; DEPOSITION TEMPERATURES; DIETHYLZINC; GERMANIUM DOPING; HIGH RESOLUTION; NEAR BAND EDGE; OXIDE MATRIX; SUBSTRATE TEMPERATURE; TEMPERATURE RANGE; TRANSMISSION ELECTRON MICROGRAPH; ULTRAVIOLET EMISSION; WATER VAPOUR;

ATOMIC LAYER DEPOSITION; OXIDE FILMS; SEMICONDUCTOR DOPING; X RAY DIFFRACTION; ZINC OXIDE;

GERMANIUM;

EID: 84862188346 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c2jm31391j Document Type: Article

Times cited : (34)

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