Erratum: Studies of electrical resistivity and magnetic properties of nanocrystalline CoFeCu thin films electrodeposited from citrate-added baths (Journal of Materials Science: Materials in Electronics DOI: 10.1007/s10854-011-0568-6);Studies of electrical resistivity and magnetic properties of nanocrystalline CoFeCu thin films electrodeposited from citrate-added baths

Journal of Materials Science: Materials in Electronics

Volumn 23, Issue 6, 2012, Pages 1174-1181

  Mehrizi, S ^a   Heydarzadeh Sohi, M ^a   Shafahian, E ^a   Khangholi, A A ^a  

^a UNIVERSITY OF TEHRAN   (Iran)

Author keywords

[No Author keywords available]

Indexed keywords

COERCIVE FORCE; CORROSION; CRYSTAL STRUCTURE; CURRENT DENSITY; DEPOSITS; ELECTRIC CONDUCTIVITY; ELECTRODEPOSITION; ELECTRODES; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; NANOCRYSTALS; SATURATION MAGNETIZATION; TERNARY ALLOYS;

DEPOSITED FILMS; FINER GRAINS; FOUR PROBE POINTS; HOMOGENOUS STRUCTURE; NANOCRYSTALLINES; SINGLE PHASE FILM; SOFT MAGNETIC PROPERTIES; TEM IMAGES;

THIN FILMS;

EID: 84861941386     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-012-0650-8     Document Type: Erratum

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