The effect of operating temperature on gasochromic properties of amorphous and polycrystalline pulsed laser deposited WO 3 films

Sensors and Actuators, B: Chemical

Volumn 169, Issue , 2012, Pages 284-290

  Garavand, N Tahmasebi ^a   Mahdavi, S M ^a   Zad, A Iraji ^a   Ranjbar, M ^a  

^a SHARIF UNIVERSITY OF TECHNOLOGY   (Iran)

Author keywords

Gasochromic; Pulsed laser deposition; Temperature effects; Tungsten oxide film

Indexed keywords

AMORPHOUS SAMPLES; ANNEALED FILMS; ANNEALING TEMPERATURES; AS-DEPOSITED FILMS; CHEMICAL COMPOSITIONS; CRYSTALLINE PHASE; DIFFUSION LENGTH; EFFECT OF WATER; GASOCHROMIC; HYDROGEN REDUCTION; OPERATING TEMPERATURE; PD NANO PARTICLE; POLYCRYSTALLINE; POLYCRYSTALLINE FILM; POLYCRYSTALLINE SAMPLES; SURFACE-TO-VOLUME RATIO; TUNGSTEN OXIDE; TUNGSTEN OXIDE FILMS; XRD;

AMORPHOUS FILMS; ANNEALING; DESORPTION; HYDROGEN; MICROSTRUCTURE; OXIDE FILMS; OXIDES; PULSED LASER DEPOSITION; TEMPERATURE; THERMAL EFFECTS; TUNGSTEN COMPOUNDS;

AMORPHOUS MATERIALS;

EID: 84861873809     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2012.04.082     Document Type: Article

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