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Volumn 83, Issue 3, 2012, Pages

An in-vacuum x-ray diffraction microscope for use in the 0.7-2.9 keV range

(18)  Vine, D J a,b,c   Williams, G J a,d   Clark, J N a,e,f   Putkunz, C T a,b   Pfeifer, M A a,g   Legnini, D c   Roehrig, C c   Wrobel, E c   Huwald, E e   Van Riessen, G a,e   Abbey, B a,b   Beetz, T h,i   Irwin, J h   Feser, M h   Hornberger, B h   McNulty, I c   Nugent, K A a,b   Peele, A G a,e,j  


Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE FEEDBACK; ADVANCED PHOTON SOURCE; BEAM LINES; COHERENT X-RAY DIFFRACTION; DIFFRACTIVE IMAGING; DYNAMIC RANGE; EXPOSURE TIME; FRESNEL; IN-VACUUM; INTENSITY MEASUREMENTS; LIMIT MOTION; MICROSCOPE DESIGN; PLANE WAVE ILLUMINATION; POINT PROJECTION; SIGNAL TO NOISE; UPPER BOUND;

EID: 84861650767     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3688655     Document Type: Review
Times cited : (17)

References (22)
  • 4
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    • 10.1080/00018730903270926
    • K. A. Nugent, Adv. Phys. 59, 1 (2010). 10.1080/00018730903270926
    • (2010) Adv. Phys. , vol.59 , pp. 1
    • Nugent, K.A.1
  • 5
    • 77955871089 scopus 로고    scopus 로고
    • 10.1080/09500340.2010.495459
    • H. M. Quiney, J. Mod. Opt. 57, 1109 (2010). 10.1080/09500340.2010.495459
    • (2010) J. Mod. Opt. , vol.57 , pp. 1109
    • Quiney, H.M.1
  • 12
    • 0012279067 scopus 로고    scopus 로고
    • 10.1063/1.1290504
    • C. Wang, Rev. Sci. Instrum. 71, 3933 (2000). 10.1063/1.1290504
    • (2000) Rev. Sci. Instrum. , vol.71 , pp. 3933
    • Wang, C.1
  • 21
    • 84861586022 scopus 로고    scopus 로고
    • U.S. Patent 6,822,733 (23 November)
    • D. Shu, U.S. Patent 6,822,733 (23 November 2004).
    • (2004)
    • Shu, D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.