Growth of single-crystalline Cu 2O (111) film on ultrathin MgO modified α-Al 2O 3 (0001) substrate by molecular beam epitaxy

Journal of Crystal Growth

Volumn 353, Issue 1, 2012, Pages 63-67

  Li, Junqiang ^a   Mei, Zengxia ^a   Ye, Daqian ^a   Liang, Huili ^a   Liu, Yaoping ^a   Du, Xiaolong ^a  

^a INSTITUTE OF PHYSICS   (China)

Author keywords

A1. Reflection high energy electron diffraction; A1. X ray diffraction; A3. Molecular beam epitaxy; B1. Cuprous oxide; B2. Semiconducting material

Indexed keywords

CRITICAL THICKNESS; CRYSTAL QUALITIES; CRYSTALLINITIES; CUPROUS OXIDE; IN-PLANE ORIENTATION; MGO; RADIO FREQUENCY PLASMA; SEMICONDUCTING MATERIALS; SINGLE-CRYSTALLINE; SINGLE-CRYSTALLINE FILM; ULTRA-THIN;

CRYSTALLINE MATERIALS; EPITAXIAL GROWTH; MOLECULAR BEAM EPITAXY; SAPPHIRE; X RAY DIFFRACTION;

COPPER;

EID: 84861533514     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2012.05.014     Document Type: Article

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