Extending the DRAM and FLASH memory technologies to 10nm and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8326, Issue , 2012, Pages

  Kim, Kinam ^a   Chung, U In ^a   Park, Youngwoo ^a   Lee, Jooyoung ^a   Yeo, Jeongho ^a   Kim, Dongchan ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Double patterning; DRAM; EUV; Multiple patterning; NAND; Patterning

Indexed keywords

DOUBLE PATTERNING; EUV; MULTIPLE PATTERNING; NAND; PATTERNING;

ASPECT RATIO; DYNAMIC RANDOM ACCESS STORAGE; LITHOGRAPHY; PRODUCTIVITY;

FLASH MEMORY;

EID: 84861496215     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.920053     Document Type: Conference Paper

References (7)

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