SCOPUS 정보 검색 플랫폼

Volumn 5, Issue 5, 2012, Pages

Effect of hydrogen reduction on characteristics of Cu thin-films deposited by RF-driven Ar/H 2 atmospheric pressure plasma jet

(6) Nakahiro, Hisashi a Zhao, Peng a,b Ogino, Akihisa a Zheng, Wei c Meng, Yuedong b Nagatsu, Masaaki a

a SHIZUOKA UNIVERSITY (Japan)

b INSTITUTE OF PLASMA PHYSICS (China)

c YAZAKI CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE PLASMA JETS; CARRIER GAS; CU FILMS; EFFECT OF HYDROGEN; HIGH PURITY; HYDROGEN REDUCTION; INTENSE EMISSION; OXIDIZATION; POSITIVE SYSTEMS; QUARTZ TUBES; THIN WIRES; X-RAY PHOTOELECTRONS;

GAS EMISSIONS; HYDROGEN; METALLIC FILMS; PLASMA JETS;

COPPER;

EID: 84861398060 PISSN: 18820778 EISSN: 18820786 Source Type: Journal
DOI: 10.1143/APEX.5.056201 Document Type: Article

Times cited : (28)

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