Effect of composition on electrical properties of multifunctional silicon nitride films deposited at temperatures below 200°C

Journal of Korean Institute of Metals and Materials

Volumn 50, Issue 4, 2012, Pages 331-337

  Keum, Ki Su ^a   Hwang, Jae Dam ^a   Kim, Joo Youn ^a   Hong, Wan Shick ^a  

^a University of Seoul   (South Korea)

Author keywords

Dielectric; Low temperature; PE CVD; Photonic device; Silicon nitride

Indexed keywords

BREAKDOWN FIELD; BULK RESISTIVITY; DIELECTRIC AND OPTICAL PROPERTIES; FILM COMPOSITION; GATE DIELECTRIC LAYERS; LOW TEMPERATURES; MAXIMUM VALUES; PHOTOLUMINESCENCE CHARACTERISTICS; PROCESS TEMPERATURE; RF PLASMA; SHORTER WAVELENGTH; SILICON NITRIDE FILM; SOURCE GAS; STOICHIOMETRIC COMPOSITIONS;

DIELECTRIC MATERIALS; GATE DIELECTRICS; NITROGEN; OPTICAL PROPERTIES; PHOTONIC DEVICES; SILICON NITRIDE; STOICHIOMETRY; THIN FILM TRANSISTORS;

ELECTRIC PROPERTIES;

EID: 84861327449     PISSN: 17388228     EISSN: None     Source Type: Journal    
DOI: 10.3365/KJMM.2012.50.4.331     Document Type: Article

References (12)

1. W. A. MacDonald, J. Mater. Chem. 14, 299 (2004).
2. H. Gleskova, S. Wagner, V. Gasparik, and P. Kovac. Appl. Surf. Sci. 175, 12 (2001).
3. A. J. Nozik, Phys E, 14, 115 (2002).
4. G. N. Parsons, J. H. Souk, and J. Batey, J. Appl. Phys, 70, 1553 (1991).
5. A. Sazonov, A. Nathan, and L. D. Bogomolova. J. Noncrystalline Solids. 299, 1360 (2002).
6. J. J. Huang, C. J. Liu, H. C. Lin, C. J. Tsai, Y. P. Chen, G. R. Hu and C. C. Lee, J. Phy D: Appl. Phys. 41, 245502 (2008).
7. S. Ali, M. Gharghi, S. Sivoththaman. J. Mater. Sci. 40, 1469 (2005).
8. Lucovsky, G. Richard, P. D. Tsu, D. V. Lin, and S. Y. Markunas, J. Vaccum Sci & Tech. 4. 681 (2009).
9. V. D. Ven, E. P. Connick, and I. W. Harms, A. S. 7th international IEEE conf. Santa clara, pp. 194-201, CA, USA (2002).
10. V. Verlaan, A. D. Verkerk, W. M. Arnoldbik, C. H. M. v. d. Werf, R. Bakker, Z. S. Houweling, I. G. Romijn, D. M. Borsa, A. W. Weeber, S. L. Luxembourg, M. Zeman, H. F. W. Dekkers, and R. E. I. Schropp, Thin Solid Films. 517, 3499 (2009).
11. A. Aydinli, A. Serpenguzel, and D. Vardar, Solid State Communications 98, 273 (1995).
12. S. V. Deshpande, E. Gulari, S. W. Brown, and S. C. Rand, J. Appl. Phys. 11, 6534 (1995).