Depth of origin of sputtered atoms: Exploring the dependence on relevant target properties to identify the correlation with low-energy ranges

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 281, Issue , 2012, Pages 37-44

  Wittmaack, Klaus ^a   Mutzke, Andreas ^b  

^a INSTITUTE OF EPIDEMIOLOGY   (Germany)

^b MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

Density effect; Depth of origin; Projected range; Sputtering; Surface binding energy

Indexed keywords

AREAL DENSITIES; ATOMIC NUMBERS; COLLISION CASCADE; DENSITY EFFECTS; DEPTH OF ORIGIN; DIFFERENTIAL SPUTTERING; DIFFERENTIAL YIELDS; IMPACT ENERGY; LOW-ENERGY RANGE; MONTE CARLO; PRIMARY KNOCK-ON ATOMS; PROJECTED RANGE; RELEVANT TARGET; SPUTTERED ATOMS; SURFACE BINDING ENERGIES; TARGET ATOM; TARGET DENSITY;

BINDING ENERGY; MONTE CARLO METHODS; PROJECTILES; SPUTTERING; URANIUM; XENON;

ATOMS;

EID: 84861140030     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2012.03.028     Document Type: Article

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