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Volumn , Issue , 2011, Pages 001748-001753

Multifunction metrology platform for photovoltaics

Author keywords

[No Author keywords available]

Indexed keywords

BULK DEFECTS; COMPLEX PROCESSES; COST EFFECTIVE; FIELD-EFFECT; INTERFACE TRAP DENSITY; LIGHT-INDUCED DEGRADATION; MEASUREMENT TECHNIQUES; NON-CONTACT; PHOTOVOLTAICS; SURFACE BARRIER; SURFACE RECOMBINATIONS; WAFER SCALE;

EID: 84861032276     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2011.6186292     Document Type: Conference Paper
Times cited : (17)

References (12)
  • 1
    • 33846956167 scopus 로고    scopus 로고
    • The Present Status and Recent Advancements in Corona-Kelvin Non-contact Electrical Metrology of Dielectrics for IC-manufacturing
    • M. Wilson et al., "The Present Status and Recent Advancements in Corona-Kelvin Non-contact Electrical Metrology of Dielectrics for IC-manufacturing", ECS Transactions, 3 (3) 3-24 (2006).
    • (2006) ECS Transactions , vol.3 , Issue.3 , pp. 3-24
    • Wilson, M.1
  • 2
    • 64149113496 scopus 로고    scopus 로고
    • Digital SPV Diffusion Length Metrology (E8-Fe) for Ultra-High Purity Silicon Wafers
    • M. Wilson et al., "Digital SPV Diffusion Length Metrology (E8-Fe) for Ultra-High Purity Silicon Wafers", ECS Transactions, 16 (6) 285-301 (2008).
    • (2008) ECS Transactions , vol.16 , Issue.6 , pp. 285-301
    • Wilson, M.1
  • 3
    • 10244229850 scopus 로고    scopus 로고
    • Non-contact C-V measurements of ultra thin dielectrics
    • P. Edleman et al., "Non-contact C-V measurements of ultra thin dielectrics", Eur. Phys. J. Appl. Phys. 27, 495-498 (2004).
    • (2004) Eur. Phys. J. Appl. Phys. , vol.27 , pp. 495-498
    • Edleman, P.1
  • 6
    • 77954624398 scopus 로고    scopus 로고
    • Accelerated Light-Induced Degradation (ALID) for Monitoring of Defects in PV Silicon Wafers and Solar Cells
    • M. Wilson et al., "Accelerated Light-Induced Degradation (ALID) for Monitoring of Defects in PV Silicon Wafers and Solar Cells", J. Electron. Mater., 39 (6) 642-647 (2010).
    • (2010) J. Electron. Mater. , vol.39 , Issue.6 , pp. 642-647
    • Wilson, M.1
  • 10
    • 0000681820 scopus 로고
    • Method for the measurement of long minority carrier diffusion lengths exceeding wafer thickness
    • J. Lagowski et al., "Method for the measurement of long minority carrier diffusion lengths exceeding wafer thickness", Appl. Phys. Lett. 63, 2902 (1993).
    • (1993) Appl. Phys. Lett. , vol.63 , pp. 2902
    • Lagowski, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.