Digital SPV diffusion length metrology (E8-Fe) for ultra-high purity silicon wafers

ECS Transactions

Volumn 16, Issue 6, 2009, Pages 285-301

  Wilson, M ^a   Savtchouk, A ^a   Tarasov, I ^a   D'Amico, J ^a   Edelman, P ^a   Kochey, N ^a   Lagowski, J ^a  

^a Semiconductor Diagnostics Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; DIFFUSION; DIGITAL CONTROL SYSTEMS; EXTRACTION;

BACK-SURFACE RECOMBINATION VELOCITY; DIFFUSION LENGTH; FULL-DIGITAL; IRON DETECTION; MINORITY CARRIER DIFFUSION LENGTH; MULTI FREQUENCY; STEADY STATE DIFFUSION; ULTRA HIGH PURITY;

SILICON WAFERS;

EID: 64149113496     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2980312     Document Type: Conference Paper

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