Organic field-effect transistors with nearly non-injection barrier from source/drain electrodes to pentacene

Synthetic Metals

Volumn 162, Issue 11-12, 2012, Pages 936-940

  Yu, Xinge ^a   Yu, Junsheng ^a   Zhou, Jianlin ^a,b   Jiang, Yadong ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b CHONGQING UNIVERSITY   (China)

Author keywords

Contact resistance; Deposition rate; Dipole arrangement; Injection barrier; Organic field effect transistors

Indexed keywords

AU ELECTRODES; DEPOSITION PROCESS; DIPOLE ARRANGEMENT; INJECTION BARRIERS; NON-INJECTION; PENTACENE LAYERS; PENTACENES; SOURCE/DRAIN ELECTRODES; TOP CONTACT PENTACENE;

BUFFER LAYERS; CONTACT RESISTANCE; DEPOSITION RATES; MOLYBDENUM OXIDE; OPTIMIZATION; ORGANIC FIELD EFFECT TRANSISTORS;

ELECTRODES;

EID: 84861012892     PISSN: 03796779     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.synthmet.2012.03.012     Document Type: Article

References (25)

1. G.H. Gelinck, H.E.A. Huitema, E. van Veenendaal, E. Cantatore, L. Schrijnemakers, J.B.P.H. Van Der Putten, T.C.T. Geuns, M. Beenhakkers, J.B. Giesbers, B.H. Huisman, E.J. Meijer, E.M. Benito, F.J. Touwslager, A.W. Marsman, B.J.E. van Rens, and D.M. de Leeuw Nature Materials 3 2004 106
2. T. Sekitani, U. Zschieschang, H. Klauk, and T. Someya Nature Materials 12 2010 1015
3. J.A. Rogers, Z.N. Bao, K. Baldwin, A. Dodabalapur, B. Crone, V.R. Raju, V. Kuck, H. Katz, K. Amundson, J. Ewing, and P. Drzaic Proceedings of the National Academy of Sciences of the United States of America 98 2001 4835
4. J. Xue, and S.R. Forrest Applied Physics Letters 82 2003 136
5. T. Oyamada, H. Uchiuzou, S. Akiyama, Y. Oku, N. Shimoji, K. Matsushige, H. Sasabe, and C. Adachi Journal of Applied Physics 98 2005 074506
6. K.M. Lau, J.X. Tang, H.Y. Sun, C.S. Lee, S.T. Lee, and D.H. Yan Applied Physics Letters 88 2006 173513
7. X.H. Zhang, and B. Kippelen Journal of Applied Physics 104 2008 104504
8. F. Cicoira, C. Santato, F. Dinelli, M. Murgia, M.A. Loi, F. Biscarini, R. Zamboni, P. Heremans, and M. Muccini Advanced Functional Materials 15 2011 375
9. J. Zhang, Y. Zhao, Z. Wei, Y. Sun, Y. He, C.A. Di, W. Xu, W.P. Hu, Y.Q. Liu, and D.B. Zhu Advanced Functional Materials 21 2011 786
10. S.P. Singh, P. Sonar, A. Sellinger, and A. Dodabalapur Applied Physics Letters 94 2009 013308
11. C.W. Chu, S.H. Li, C.W. Chen, V. Shrotriya, and Y. Yang Applied Physics Letters 87 2005 193508
12. B.H. Hamdani, and D. Natelson Applied Physics Letters 84 2004 19
13. Z. Liu, M. Kobayashi, B.C. Paul, Z.N. Bao, and Y. Nishil Physical Review B 82 2010 035311
14. X.G. Yu, J.S. Yu, J.L. Zhou, J. Huang, and Y.D. Jiang Applied Physics Letters 99 2011 063306
15. J. Park, J.M. Kang, D.W. Kim, and J.S. Choi Thin Solid Films 518 2010 6232
16. X.H. Zhang, B. Domercq, and B. Kippelen Synthetic Metals 159 2009 2371
17. J.L. Zhou, F.J. Zhang, L.F. Lan, S.S. Wen, and J.B. Peng Applied Physics Letters 91 2007 253507
18. J. Huang, J.S. Yu, W. Wang, and Y.D. Jiang Applied Physics Letters 98 2011 023301
19. Z. Wang, M.W. Alam, Y. Lou, S. Naka, and H. Okada Applied Physics Letters 100 2012 043302
20. N.N. Wang, J.S. Yu, Y. Zang, J. Huang, and Y.D. Jiang Solar Energy Materials and Solar Cells 94 2010 263
21. X.G. Yu, J.S. Yu, J.L. Zhou, H. Wang, L.H. Cheng, and Y.D. Jiang Japanese Journal of Applied Physics 50 2011 104101
22. V. Heine Physical Review 138 1965 A1689
23. H. Ishii, K. Sugiyama, E. Ito, and K. Seki Advanced Materials 11 1999 605
24. C.S. Lee, J.X. Tang, Y.C. Zhou, and S.T. Lee Applied Physics Letters 94 2009 113304
25. S. Braun, W.R. Salaneck, and M. Fahlman Advanced Materials 21 2009 1450