World-best performance LTPS TFTs with robust bending properties on AMOLED displays

49th Annual SID Symposium, Seminar, and Exhibition 2011, Display Week 2011

Volumn 1, Issue , 2011, Pages 194-197

  Kim, Moojin ^a   Cheon, Junhyuk ^a   Lee, Jaeseob ^a   Park, Yonghwan ^a   An, Sungguk ^a   Kim, Taewoong ^a   Jin, Dongun ^a   Min, Hoonkee ^a   Yu, Cheolho ^a   Kim, Sungchul ^a   Jang, Jin ^b  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b Kyung Hee University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION PROCESS; AM-OLED; BACKPLANES; BENDING PROPERTIES; CRYSTALLIZATION PROCESS; CURRENT RATIOS; DISPLAY APPLICATION; EXCIMER LASER ANNEALING; FABRICATION PROCESS; FIELD-EFFECT MOBILITIES; IRRADIATED FILMS; LOW TEMPERATURE POLYCRYSTALLINE SILICON; ON/OFF RATIO; PLASTIC SUBSTRATES; PLASTIC SURFACES; POLY-SI TFTS; POLYCRYSTALLINE SILICON (POLY-SI); SPECTROSCOPIC METHOD; THERMAL SIMULATIONS;

ATOMIC FORCE MICROSCOPY; DISPLAY DEVICES; EXCIMER LASERS; EXHIBITIONS; LIGHT EMITTING DIODES; POLYSILICON; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ANALYSIS; SUBSTRATES; X RAY DIFFRACTION;

THIN FILM TRANSISTORS;

EID: 84860777620     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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