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Volumn 46, Issue 1, 2012, Pages 43-46

Plasma-Enhanced Chemical Vapour Deposition Of Octafluorocyclobutane Onto Carbonyl Iron Particles

Author keywords

Carbonyl iron; Fluoropolymer; Functionalization; Modification; Octafluorocyclobutane; Plasma; Surface

Indexed keywords


EID: 84860733528     PISSN: 15802949     EISSN: 15803414     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (8)

References (21)
  • 6
    • 0037427428 scopus 로고    scopus 로고
    • M. Mozetič,Vacuum, 71 (2003) 1-2, 237
    • (2003) Vacuum , vol.71 , Issue.1-2 , pp. 237
    • Mozetič, M.1
  • 17
    • 2142699718 scopus 로고    scopus 로고
    • Proc. of the society of photo-optical instrumentation engineers (SPIE), San Jose
    • M. Wasilik, N. Chen:Deep reactive ion etch conditioning recipe, Proc. of the society of photo-optical instrumentation engineers (SPIE), San Jose, 2004, 103-110
    • (2004) N. Chen:Deep reactive ion etch conditioning recipe , pp. 103-110
    • Wasilik, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.