Deep Reactive Ion Etch Conditioning Recipe

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5342, Issue , 2004, Pages 103-110

  Wasilik, Matthew ^a   Chen, Ning ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Bosch Process; Conditioning recipe; Deep Reactive Ion Etch; DRIE; Seasoning recipe

Indexed keywords

INDUCTIVELY COUPLED PLASMA; MASKS; REACTIVE ION ETCHING; SEMICONDUCTING SILICON; THERMAL EFFECTS; VALVES (MECHANICAL);

BOSCH PROCESS; CONDITIONING RECIPE; DEEP REACTIVE ION ETCH; DRIE; SEASONING RECIPE;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 2142699718     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.522941     Document Type: Conference Paper

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