Characteristics and durability of fluoropolymer thin films

Polymer Degradation and Stability

Volumn 96, Issue 4, 2011, Pages 561-565

  Cheneler, David ^a   Bowen, James ^a   Evans, Stephen D ^b   Górzny, Marcin ^b   Adams, Michael J ^a   Ward, Michael C L ^a  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

^b UNIVERSITY OF LEEDS   (United Kingdom)

Author keywords

Atomic force microscopy; Etchant; Fluoropolymer; pH; Wetting; X ray photoelectron spectroscopy

Indexed keywords

ACIDIC AQUEOUS SOLUTION; AQUEOUS LIQUIDS; AQUEOUS SOLUTIONS; CHARACTERISATION; DEEP REACTIVE ION ETCHING; DYNAMIC WETTING MEASUREMENTS; ETCHANT; FLUOROPOLYMER; MICROELECTROMECHANICAL SYSTEMS; SEM;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ELECTRON BEAM LITHOGRAPHY; ELECTRONS; FLUORINE CONTAINING POLYMERS; MEMS; MICROELECTROMECHANICAL DEVICES; ORGANIC SOLVENTS; PASSIVATION; PHOTOELECTRICITY; PHOTONS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SOLUTIONS; THIN FILMS; WETTING; X RAYS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 79952186806     PISSN: 01413910     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymdegradstab.2010.12.022     Document Type: Article

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