Quantitative analysis of the weak anti-localization effect in ultrathin bismuth films

EPL

Volumn 95, Issue 3, 2011, Pages

  Sangiao, S ^a   Marcano, N ^a,b   Fan, J ^a,c   Morellon L ^a   Ibarra, M R ^a   De Teresa, J M ^a  

^a UNIVERSITY OF ZARAGOZA   (Spain)

^b CENTRO UNIVERSITARIO DE LA DEFENSA   (Spain)

^c NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84860404013     PISSN: 02955075     EISSN: 12864854     Source Type: Journal    
DOI: 10.1209/0295-5075/95/37002     Document Type: Article

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