Thermal degradation of hepta cyclopentyl, mono phenyl-polyhedral oligomeric silsesquioxane (hcp-POSS)/polystyrene (PS) nanocomposites

Polymer Degradation and Stability

Volumn 97, Issue 6, 2012, Pages 849-855

  Blanco, Ignazio ^a   Abate, Lorenzo ^a   Bottino, Francesco Agatino ^a   Bottino, Paola ^a  

^a UNIVERSITY OF CATANIA   (Italy)

Author keywords

Kinetics of degradation; Polystyrene nanocomposites; POSS; Thermal stability

Indexed keywords

DEGRADATION RATE; KINETICS OF DEGRADATION; LITERATURE DATA; MASS LOSS; POLYHEDRAL OLIGOMERIC SILSESQUIOXANES; POLYSTYRENE NANOCOMPOSITES; POSS; SCANNING MODE; SILSESQUIOXANES; STATIC AIR; THERMAL PARAMETERS; THERMALLY STABLE; THERMO-BALANCE; THERMOGRAVIMETRIC;

ACTIVATION ENERGY; DEGRADATION; HEAT RESISTANCE; OLIGOMERS; POLYSTYRENES; STYRENE; THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS;

NANOCOMPOSITES;

EID: 84860362767     PISSN: 01413910     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymdegradstab.2012.03.041     Document Type: Article

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