Remarkable AO resistance of POSS inorganic/organic polymers

International SAMPE Symposium and Exhibition (Proceedings)

Volumn 45, Issue , 2000, Pages

  Phillips, Shawn H ^a   Gonzalez, Rene I ^a   Chaffee, Kevin P ^a   Haddad, Timothy S ^a   Hoflund, Gar B ^a   Hsiao, Benjamin S ^a   Fu, Bruce X ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC MATERIALS; DECOMPOSITION; DEGRADATION; HEAT RADIATION; IRRADIATION; OXIDATION RESISTANCE; PASSIVATION; SYNTHESIS (CHEMICAL); THERMAL CYCLING; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYHEDRAL OLIGOMETRIC SILSESQUIOXANE (POSS); VACUUM-ULTRAVIOLET IRRADIATION;

OLIGOMERS;

EID: 0033670815     PISSN: 08910138     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (21)