Pressure-sensitive adhesion system using acrylate block copolymers in response to photoirradiation and postbaking as the dual external stimuli for on-demand dismantling

ACS Applied Materials and Interfaces

Volumn 4, Issue 4, 2012, Pages 2124-2132

  Inui, Tadashi ^a   Sato, Eriko ^a   Matsumoto, Akikazu ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

acrylic polymer; block copolymer; dismantlable adhesion; living radical polymerization; photoacid generator; pressure sensitive adhesive

Indexed keywords

ACRYLIC POLYMERS; DISMANTLABLE ADHESION; LIVING RADICAL POLYMERIZATION; PHOTOACID GENERATORS; PRESSURE-SENSITIVE ADHESIVES;

ADHESIVES; ATOM TRANSFER RADICAL POLYMERIZATION; BLOCK COPOLYMERS; CARBOXYLIC ACIDS; LIVING POLYMERIZATION; PHOTORESISTORS; THERMOGRAVIMETRIC ANALYSIS;

ADHESION;

ACRYLIC ACID DERIVATIVE; POLYMER;

ARTICLE; CHEMICAL STRUCTURE; CHEMISTRY; POLYMERIZATION; PRESSURE; RADIATION EXPOSURE; SYNTHESIS; ULTRAVIOLET RADIATION;

ACRYLATES; MOLECULAR STRUCTURE; POLYMERIZATION; POLYMERS; PRESSURE; ULTRAVIOLET RAYS;

EID: 84860324425     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am300103c     Document Type: Article

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