Influence of annealing on characteristics of tin disulfide thin films by vacuum thermal evaporation

Thin Solid Films

Volumn 520, Issue 15, 2012, Pages 4898-4901

  Shi, Chengwu ^a,b   Chen, Zhu ^a,b   Shi, Gaoyang ^a,b   Sun, Renjie ^a   Zhan, Xiaoping ^a,b   Shen, Xinjie ^a,b  

^a HEFEI UNIVERSITY OF TECHNOLOGY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Annealing; Crystal microstructure; Scanning electron microscopy; Thin films; Tin disulfide; Vacuum thermal evaporation; X ray diffraction

Indexed keywords

ANNEALING TEMPERATURES; AS-GROWN; CHEMICAL COMPOSITIONS; CRACK FREE; HEXAGONAL PHASE; PREFERRED ORIENTATIONS; SCANNING ELECTRON MICROSCOPE; SODA LIME GLASS SUBSTRATE; SPHERICAL SHAPE; THIN FILM SOLAR CELLS; VACUUM THERMAL EVAPORATION; WINDOW LAYER;

ANNEALING; CRYSTAL MICROSTRUCTURE; OPTICAL BAND GAPS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SULFUR COMPOUNDS; TIN; TINNING; X RAY DIFFRACTION;

THIN FILMS;

EID: 84860291336     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.03.050     Document Type: Article

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