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Thin Solid Films

Volumn 520, Issue 14, 2012, Pages 4666-4668

Optimization of ZnO/Ag/ZnO multilayer electrodes obtained by Ion Beam Sputtering for optoelectronic devices

(6) El Hajj, A a Lucas, B a Chakaroun, M a Antony, R a Ratier, B a Aldissi, M b

a UNIVERSITY OF LIMOGES (France)

b Fractal Systems Inc (United States)

Author keywords

Ion beam sputtering technology; Transparent conductive oxide; ZnO Ag ZnO electrode

Indexed keywords

ANTI-REFLECTION; ELECTRICAL AND OPTICAL PROPERTIES; FIGURE OF MERITS; HIGH TRANSMITTANCE; ION-BEAM SPUTTERING; LAYER THICKNESS; METALLIC LAYERS; MULTILAYER ELECTRODES; MULTILAYER STRUCTURES; OPTIMAL ELECTRODES; OXIDE LAYER; TRANSPARENT CONDUCTIVE OXIDES; ZNO; ZNO LAYERS;

ELECTRIC PROPERTIES; ELECTRODES; OPTICAL PROPERTIES; OPTIMIZATION; OPTOELECTRONIC DEVICES; SHEET RESISTANCE; ZINC OXIDE;

METALLIC COMPOUNDS;

EID: 84860280946 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.10.193 Document Type: Conference Paper

Times cited : (67)

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