Structural, electrical and optical properties of thermochromic VO 2 thin films obtained by reactive electron beam evaporation

Thin Solid Films

Volumn 520, Issue 14, 2012, Pages 4823-4825

  Leroy, J ^a   Bessaudou, A ^a   Cosset, F ^a   Crunteanu, A ^a  

^a UNIVERSITY OF LIMOGES   (France)

Author keywords

Electrical resistivity; Metal insulator transition; Optical transmission; Physical vapor deposition; Thin films; Vanadium dioxide; X rays diffraction

Indexed keywords

ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL RESISTIVITY; EXPERIMENTAL CONDITIONS; EXPERIMENTAL PARAMETERS; INCIDENT POWER; MONOCRYSTALLINE STRUCTURES; OXYGEN ATMOSPHERE; OXYGEN FLOW; PHYSICAL CHARACTERIZATION; RADIO FREQUENCIES; REACTIVE ELECTRON BEAM EVAPORATION; SUBSTRATE TEMPERATURE; TEMPERATURE DEPENDENCE; THERMO-CHROMIC; THERMOCHROMIC PROPERTIES; VANADIUM DIOXIDE; VANADIUM TARGET; X-RAYS DIFFRACTION;

ELECTRIC CONDUCTIVITY; ELECTRON BEAMS; EVAPORATION; LIGHT TRANSMISSION; OPTICAL PROPERTIES; OXYGEN; PHASE TRANSITIONS; PHYSICAL VAPOR DEPOSITION; SEMICONDUCTOR INSULATOR BOUNDARIES; VANADIUM; VANADIUM COMPOUNDS; X RAY DIFFRACTION;

THIN FILMS;

EID: 84860276912     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.08.035     Document Type: Conference Paper

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