Strong green emission in ZnO films after H 2 surface treatment

Journal of Physics D: Applied Physics

Volumn 45, Issue 18, 2012, Pages

  Li, T ^a   Herng, T S ^a   Liang, H K ^b   Bao, N N ^a   Chen, T P ^c   Wong, J I ^c   Xue, J M ^a   Ding, J ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEX DEFECTS; CYCLIC ANNEALING; EMISSION INTENSITY; FABRICATION TECHNIQUE; GREEN EMISSIONS; HIGH-TEMPERATURE ANNEALING; LOW TEMPERATURE PHOTOLUMINESCENCE; OPTICAL CAVITIES; OPTOELECTRONIC APPLICATIONS; PLD DEPOSITION; POROUS STRUCTURES; RANDOM LASING; STRUCTURAL DEFECT; STRUCTURAL STUDIES; ULTRA-VIOLET; ZNO; ZNO FILMS; ZNO THIN FILM;

ACETONE; ANNEALING; FABRICATION; HYDROGEN; OPTICAL FILMS; PULSED LASER DEPOSITION; QUANTUM YIELD; SURFACE TREATMENT; ZINC OXIDE;

METALLIC FILMS;

EID: 84860183177     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/45/18/185102     Document Type: Article

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