Improving the quality factor of cantilevers in viscous fluids by the adaptation of their interface

Applied Physics Letters

Volumn 100, Issue 11, 2012, Pages

  Linden, J ^a   Oesterschulze, E ^a  

^a University of Koblenz Landau   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH QUALITY FACTORS; HYDRODYNAMIC DAMPING; MASS SENSOR; MENISCUS FORMATION; PARTIAL WETTING; QUALITY FACTORS; THIN FILM SILICON; VISCOUS FLUIDS;

SILICON NITRIDE; VISCOUS FLOW; WETTING;

NANOCANTILEVERS;

EID: 84859945428     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3694264     Document Type: Article

References (11)

1. Y. Song and B. Bhushan, J. Phys. Condens. Matter 20, 1015 (2008). 10.1088/0953-8984/20/22/225012
2. P. S. Waggoner and H. G. Craighead, Lab Chip 7, 1238 (2007). 10.1039/b707401h
3. K. L. Ekinci, X. M. H. Huang, and M. L. Roukes, Appl. Phys. Lett. 84, 4469 (2004). 10.1063/1.1755417
4. G. Y. Chen, R. J. Warmack, T. Thundat, and D. P. Allison, Rev. Sci. Instrum. 65, 2532 (1994). 10.1063/1.1144647
5. J. E. Sader, J. Appl. Phys. 84, 64 (1998). 10.1063/1.368002
6. J. W. M. Chon, P. Mulvaney, and J. E. Sader, J. Appl. Phys. 87, 3978 (2000). 10.1063/1.372455
7. C. Vancura, Y. Li, J. Lichtenberg, K. U. Kirstein, A. Hierlemann, and F. Josse, Anal. Chem. 79, 1646 (2007). 10.1021/ac061795g
8. L. Beardslee, A. Addous, S. Heinrich, F. Josse, I. Dufour, and O. Brand, J. Microelectromech. Syst. 19, 1015 (2010). 10.1109/JMEMS.2010.2052093
9. C. Castille, I. Dufour, and C. Lucat, App. Phys. Lett. 96, 154102 (2010). 10.1063/1.3387753
10. J. H. Seo and O. Brand, J. Microelectromech. Syst. 17, 483 (2008). 10.1109/JMEMS.2008.916328
11. J. F. Vignola, J. A. Judge, J. Jarzynski, M. Zalalutdinov, B. H. Houston, and J. W. Baldwin, Appl. Phys. Lett. 88, 041921 (2006). 10.1063/1.2165186