Effect of silanization film thickness in soft lithography of nanoscale features

Journal of Nanotechnology in Engineering and Medicine

Volumn 2, Issue 4, 2011, Pages

  Ting, Lucas H ^a   Feghhi, Shirin ^a   Han, Sangyoon J ^a   Rodriguez, Marita L ^a   Sniadecki, Nathan J ^a  

^a University of Washington   (United States)

Author keywords

e beam lithography; PDMS; PMMA; silane; soft lithography

Indexed keywords

CRITICAL PARAMETER; E-BEAM LITHOGRAPHY; EXPOSURE-TIME; NANO SCALE; NANOSCALE FEATURES; PDMS; PMMA; POLYDIMETHYLSILOXANE PDMS; SILANE FILMS; SILANIZATIONS; SOFT LITHOGRAPHY;

COATINGS; ELECTRON BEAM LITHOGRAPHY; MICROCHANNELS; SCANNING ELECTRON MICROSCOPY; SILANES; SILICONES; VAPORS;

NANOTECHNOLOGY;

DIMETICONE; POLY(METHYL METHACRYLATE); SILANE;

ANALYTIC METHOD; ARTICLE; BIOFILM; CHEMICAL ANALYSIS; CHEMICAL MODIFICATION; CHEMICAL STRUCTURE; CONCENTRATION (PARAMETERS); CONTROLLED STUDY; ELECTRON BEAM; FILM COATING; IMAGE ANALYSIS; IMAGE DISPLAY; INTERMETHOD COMPARISON; MOLECULAR DYNAMICS; MOLECULAR INTERACTION; MOLECULAR WEIGHT; NANOFABRICATION; NANOIMAGING; PARTICLE SIZE; SCANNING ELECTRON MICROSCOPY; SILANIZATION; SOFT LITHOGRAPHY; SURFACE PROPERTY; THICKNESS; VAPOR;

EID: 84859858212     PISSN: 19492944     EISSN: 19492952     Source Type: Journal    
DOI: 10.1115/1.4005665     Document Type: Article

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