Nanostructural, chemical, and mechanical features of nc-Si:H films prepared by PECVD

International Journal of Photoenergy

Volumn 2012, Issue , 2012, Pages

  Son, Jong Ick ^a   Nam, Hee Jong ^a   Cho, Nam Hee ^a  

^a Inha University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

FILM THICKNESS; NANOCRYSTALLINE SILICON; NANOCRYSTALLITES; NANOCRYSTALS; PLASMA CVD; SILICON COMPOUNDS; THICK FILMS;

CHEMICAL FEATURES; DEPOSITION TIME; FILM-THICKNESS; MECHANICAL FEATURE; NANOCRYSTALLITE SIZE; NANOSTRUCTURAL; NC-SI:H; SI NANOCRYSTALLITES; SI-FILMS; SOURCE GAS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 84859761988     PISSN: 1110662X     EISSN: 1687529X     Source Type: Journal    
DOI: 10.1155/2012/643895     Document Type: Article

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