Importance of line and interfacial energies during VLS growth of finely stranded silica nanowires

Journal of Materials Research

Volumn 26, Issue 17, 2011, Pages 2247-2253

  Bettge, Martin ^a,b   Maclaren, Scott ^b   Burdin, Steve ^b   Abraham, Daniel ^c   Petrov, Ivan ^b   Yu, Min Feng ^a   Sammann, Ernie ^b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b University of Illinois at Urbana Champaign   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

Ion beam processing; Nanoscale; Oxide

Indexed keywords

CRYSTALLINE GROWTH; ION BEAM PROCESSING; NANO SCALE; RESEARCH HISTORY; SILICA NANO WIRES; SURFACE ENERGY EFFECTS; THREE PHASE BOUNDARY; VAPOR-LIQUID-SOLID;

DROPS; INDIUM; INTERFACIAL ENERGY; LIQUIDS; NANOWIRES; OXIDES; VAPORS;

SILICA;

EID: 84859599209     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/jmr.2011.151     Document Type: Article

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