Performance evaluation of direct laser lithography system for rotationally symmetric diffractive optical elements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8249, Issue , 2012, Pages

  Kim, Dong Ik ^a   Rhee, Hyug Gyo ^b   Kim, Geon Hee ^a  

^a Korea Basic Science Institute (KBSI)   (South Korea)

^b Korea Research Institute of Standards and Science   (South Korea)

Author keywords

Diffractive optical elements; Direct laser lithography; Standard uncertainty

Indexed keywords

COMPUTER GENERATED HOLOGRAMS; DIRECT LASER LITHOGRAPHY; FRESNEL ZONE PLATE; LASER LITHOGRAPHY; LITHOGRAPHY SYSTEMS; PERFORMANCE EVALUATION; STANDARD UNCERTAINTY; WORKING AREAS;

COMPUTER GENERATED HOLOGRAPHY; DENSITY (OPTICAL); DIFFRACTIVE OPTICAL ELEMENTS; FABRICATION; LIGHT SOURCES;

LITHOGRAPHY;

EID: 84859582890     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.906548     Document Type: Conference Paper

References (10)

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