Extreme ultraviolet multilayer for the FERMI@Elettra free electron laser beam transport system

Optics Express

Volumn 20, Issue 7, 2012, Pages 8006-8014

  Corso, Alain Jody ^a,b   Zuppella, Paola ^a   Windt, David L ^c   Zangrando, Marco ^d   Pelizzo, Maria Guglielmina ^a,b  

^a CNR   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

^c Reflective X ray Optics LLC   (United States)

^d SINCROTRONE TRIESTE   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

FREE ELECTRON LASERS; REFLECTION;

BEAM TRANSPORT SYSTEM; CAPPING LAYER; EXTREME ULTRAVIOLET MULTILAYERS; FILTER PROPERTIES; FUNDAMENTAL HARMONIC; MULTILAYER STRUCTURES;

MULTILAYERS;

ARTICLE; ELECTRON; EQUIPMENT; EQUIPMENT DESIGN; LASER; OPTICAL INSTRUMENTATION; ULTRAVIOLET RADIATION;

ELECTRONS; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LASERS; LENSES; ULTRAVIOLET RAYS;

EID: 84859417720     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.20.008006     Document Type: Article

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