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Volumn 85, Issue 7, 2012, Pages

Electron surface layer at the interface of a plasma and a dielectric wall

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EID: 84857719956     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.85.075323     Document Type: Article
Times cited : (61)

References (60)
  • 1
    • 34249037121 scopus 로고    scopus 로고
    • Complex plasma: Dusts in plasma
    • DOI 10.1088/0022-3727/40/8/R01, PII S0022372707214287, R01
    • O. Ishihara, J. Phys. D: Appl. Phys. JPAPBE 0022-3727 10.1088/0022-3727/40/8/R01 40, R121 (2007). (Pubitemid 46778396)
    • (2007) Journal of Physics D: Applied Physics , vol.40 , Issue.8
    • Ishihara, O.1
  • 2
    • 27644473754 scopus 로고    scopus 로고
    • Complex (dusty) plasmas: Current status, open issues, perspectives
    • DOI 10.1016/j.physrep.2005.08.007, PII S0370157305003339
    • V. E. Fortov, A. V. Ivlev, S. A. Khrapak, A. G. Khrapak, and G. E. Morfill, Phys. Rep. PRPLCM 0370-1573 10.1016/j.physrep.2005.08.007 421, 1 (2005). (Pubitemid 41554024)
    • (2005) Physics Reports , vol.421 , Issue.1-2 , pp. 1-103
    • Fortov, V.E.1    Ivlev, A.V.2    Khrapak, S.A.3    Khrapak, A.G.4    Morfill, G.E.5
  • 3
    • 0036671342 scopus 로고    scopus 로고
    • PSTEEU 0963-0252 10.1088/0963-0252/11/3A/333
    • D. A. Mendis, Plasma Sources Sci. Technol. PSTEEU 0963-0252 10.1088/0963-0252/11/3A/333 11, A219 (2002).
    • (2002) Plasma Sources Sci. Technol. , vol.11 , pp. 219
    • Mendis, D.A.1
  • 4
    • 0037285214 scopus 로고    scopus 로고
    • Dielectric-Barrier Discharges: Their History, Discharge Physics, and Industrial Applications
    • DOI 10.1023/A:1022470901385
    • U. Kogelschatz, Plasma Chem. Plasma Process. PCPPDW 0272-4324 10.1023/A:1022470901385 23, 1 (2003). (Pubitemid 36257393)
    • (2003) Plasma Chemistry and Plasma Processing , vol.23 , Issue.1 , pp. 1-46
    • Kogelschatz, U.1
  • 5
    • 33745450143 scopus 로고    scopus 로고
    • Measurement and 3D simulation of self-organized filaments in a barrier discharge
    • DOI 10.1103/PhysRevLett.96.255001
    • L. Stollenwerk, S. Amiranashvili, J.-P. Boeuf, and H.-G. Purwins, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.96.255001 96, 255001 (2006). (Pubitemid 43955945)
    • (2006) Physical Review Letters , vol.96 , Issue.25 , pp. 255001
    • Stollenwerk, L.1    Amiranashvili, Sh.2    Boeuf, J.-P.3    Purwins, H.-G.4
  • 6
    • 34547382563 scopus 로고    scopus 로고
    • Spatially resolved surface-charge measurement in a planar dielectric-barrier discharge system
    • DOI 10.1103/PhysRevLett.98.255001
    • L. Stollenwerk, J. G. Laven, and H.-G. Purwins, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.98.255001 98, 255001 (2007). (Pubitemid 47139948)
    • (2007) Physical Review Letters , vol.98 , Issue.25 , pp. 255001
    • Stollenwerk, L.1    Laven, J.G.2    Purwins, H.-G.3
  • 7
    • 78649861829 scopus 로고    scopus 로고
    • EPJDF6 1434-6060 10.1140/epjd/e2010-00272-7
    • R. Dussart, Eur. Phys. J. D EPJDF6 1434-6060 10.1140/epjd/e2010-00272-7 60, 601 (2010).
    • (2010) Eur. Phys. J. D , vol.60 , pp. 601
    • Dussart, R.1
  • 10
    • 27744490554 scopus 로고    scopus 로고
    • Microcavity plasma photodetectors: Photosensitivity, dynamic range, and the plasma-semiconductor interface
    • DOI 10.1063/1.2072767, 141101
    • N. P. Ostrom and J. G. Eden, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2072767 87, 141101 (2005). (Pubitemid 41717192)
    • (2005) Applied Physics Letters , vol.87 , Issue.14 , pp. 1-3
    • Ostrom, N.P.1    Eden, J.G.2
  • 11
    • 21044431908 scopus 로고    scopus 로고
    • Modelling of microdischarge devices: Plasma and gas dynamics
    • DOI 10.1088/0022-3727/38/11/001, PII S0022372705906529
    • M. J. Kushner, J. Phys. D: Appl. Phys. JPAPBE 0022-3727 10.1088/0022-3727/38/11/001 38, 1633 (2005). (Pubitemid 40871937)
    • (2005) Journal of Physics D: Applied Physics , vol.38 , Issue.11 , pp. 1633-1643
    • Kushner, M.J.1
  • 14
    • 0026136040 scopus 로고
    • JPAPBE 0022-3727 10.1088/0022-3727/24/4/001
    • K.-U. Riemann, J. Phys. D: Appl. Phys. JPAPBE 0022-3727 10.1088/0022-3727/24/4/001 24, 493 (1991).
    • (1991) J. Phys. D: Appl. Phys. , vol.24 , pp. 493
    • Riemann, K.-U.1
  • 15
    • 0023288048 scopus 로고
    • IJELA2 0020-7217 10.1080/00207218708920971
    • K. G. Emeleus and J. R. M. Coulter, Int. J. Electron. IJELA2 0020-7217 10.1080/00207218708920971 62, 225 (1987).
    • (1987) Int. J. Electron. , vol.62 , pp. 225
    • Emeleus, K.G.1    Coulter, J.R.M.2
  • 19
    • 0037150101 scopus 로고    scopus 로고
    • Influence of interaction between charged particles and dielectric surface over a homogeneous barrier discharge in nitrogen
    • DOI 10.1088/0022-3727/35/8/306, PII S0022372702304066
    • Y. B. Golubovskii, V. A. Maiorov, J. Behnke, and J. F. Behnke, J. Phys. D: Appl. Phys. JPAPBE 0022-3727 10.1088/0022-3727/35/8/306 35, 751 (2002). (Pubitemid 34531072)
    • (2002) Journal of Physics D: Applied Physics , vol.35 , Issue.8 , pp. 751-761
    • Golubovskii, Yu.B.1    Maiorov, V.A.2    Behnke, J.3    Behnke, J.F.4
  • 20
    • 68949146851 scopus 로고    scopus 로고
    • EPJDF6 1434-6060 10.1140/epjd/e2009-00213-7
    • F. X. Bronold, H. Deutsch, and H. Fehske, Eur. Phys. J. D EPJDF6 1434-6060 10.1140/epjd/e2009-00213-7 54, 519 (2009).
    • (2009) Eur. Phys. J. D , vol.54 , pp. 519
    • Bronold, F.X.1    Deutsch, H.2    Fehske, H.3
  • 21
    • 77955362872 scopus 로고    scopus 로고
    • PRBMDO 1098-0121 10.1103/PhysRevB.81.155420
    • R. L. Heinisch, F. X. Bronold, and H. Fehske, Phys. Rev. B PRBMDO 1098-0121 10.1103/PhysRevB.81.155420 81, 155420 (2010).
    • (2010) Phys. Rev. B , vol.81 , pp. 155420
    • Heinisch, R.L.1    Bronold, F.X.2    Fehske, H.3
  • 22
    • 77957715672 scopus 로고    scopus 로고
    • PRBMDO 1098-0121 10.1103/PhysRevB.82.125408
    • R. L. Heinisch, F. X. Bronold, and H. Fehske, Phys. Rev. B PRBMDO 1098-0121 10.1103/PhysRevB.82.125408 82, 125408 (2010).
    • (2010) Phys. Rev. B , vol.82 , pp. 125408
    • Heinisch, R.L.1    Bronold, F.X.2    Fehske, H.3
  • 24
    • 79961101527 scopus 로고    scopus 로고
    • PRBMDO 1098-0121 10.1103/PhysRevB.83.195407
    • R. L. Heinisch, F. X. Bronold, and H. Fehske, Phys. Rev. B PRBMDO 1098-0121 10.1103/PhysRevB.83.195407 83, 195407 (2011).
    • (2011) Phys. Rev. B , vol.83 , pp. 195407
    • Heinisch, R.L.1    Bronold, F.X.2    Fehske, H.3
  • 26
    • 0014607817 scopus 로고
    • PRLTAO 0031-9007 10.1103/PhysRevLett.23.1238
    • M. W. Cole and M. H. Cohen, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.23.1238 23, 1238 (1969).
    • (1969) Phys. Rev. Lett. , vol.23 , pp. 1238
    • Cole, M.W.1    Cohen, M.H.2
  • 27
    • 35848942628 scopus 로고    scopus 로고
    • PRBMDO 1098-0121 10.1103/PhysRevB.76.205404
    • B. Baumeier, P. Kruger, and J. Pollmann, Phys. Rev. B PRBMDO 1098-0121 10.1103/PhysRevB.76.205404 76, 205404 (2007).
    • (2007) Phys. Rev. B , vol.76 , pp. 205404
    • Baumeier, B.1    Kruger, P.2    Pollmann, J.3
  • 31
    • 0031554915 scopus 로고    scopus 로고
    • Time-resolved coherent photoelectron spectroscopy of quantized electronic states on metal surfaces
    • DOI 10.1126/science.277.5331.1480
    • U. Hoefer, I. L. Shumay, C. Reuss, U. Thomann, W. Wallauer, and T. Fauster, Science SCIEAS 0036-8075 10.1126/science.277.5331.1480 277, 1480 (1997). (Pubitemid 27449230)
    • (1997) Science , vol.277 , Issue.5331 , pp. 1480-1482
    • Hofer, U.1    Shumay, I.L.2    Reuss, Ch.3    Thomann, U.4    Wallauer, W.5    Fauster, Th.6
  • 32
    • 0028543402 scopus 로고
    • APAMFC 0947-8396 10.1007/BF00348266
    • T. Fauster, Appl. Phys. A APAMFC 0947-8396 10.1007/BF00348266 59, 479 (1994).
    • (1994) Appl. Phys. A , vol.59 , pp. 479
    • Fauster, T.1
  • 33
    • 0000840507 scopus 로고
    • PRBMDO 1098-0121 10.1103/PhysRevB.17.5009
    • F. Stern, Phys. Rev. B PRBMDO 1098-0121 10.1103/PhysRevB.17.5009 17, 5009 (1978).
    • (1978) Phys. Rev. B , vol.17 , pp. 5009
    • Stern, F.1
  • 34
    • 0004457553 scopus 로고
    • PRBMDO 1098-0121 10.1103/PhysRevB.30.840
    • F. Stern and S. DasSarma, Phys. Rev. B PRBMDO 1098-0121 10.1103/PhysRevB.30.840 30, 840 (1984).
    • (1984) Phys. Rev. B , vol.30 , pp. 840
    • Stern, F.1    Dassarma, S.2
  • 36
    • 0022045406 scopus 로고
    • Electron density and potential distribution at a plasma-insulator interface
    • DOI 10.1016/0042-207X(85)90656-6
    • E. E. Tkharev and A. L. Danilyuk, Vacuum VACUAV 0042-207X 10.1016/0042-207X(85)90656-6 35, 183 (1985). (Pubitemid 15507413)
    • (1985) Vacuum , vol.35 , Issue.4-5 , pp. 183-187
    • Tkharev, E.E.1    Danilyuk, A.L.2
  • 37
    • 36049046910 scopus 로고
    • PHRVAO 0031-899X 10.1103/PhysRev.137.A1441
    • N. D. Mermin, Phys. Rev. PHRVAO 0031-899X 10.1103/PhysRev.137.A1441 137A, 1441 (1965).
    • (1965) Phys. Rev. , vol.137 , pp. 1441
    • Mermin, N.D.1
  • 38
    • 0042113153 scopus 로고
    • PHRVAO 0031-899X 10.1103/PhysRev.140.A1133
    • W. Kohn and L. J. Sham, Phys. Rev. PHRVAO 0031-899X 10.1103/PhysRev.140. A1133 140A, 1133 (1965).
    • (1965) Phys. Rev. , vol.140 , pp. 1133
    • Kohn, W.1    Sham, L.J.2
  • 39
    • 51149210200 scopus 로고
    • RMPHAT 0034-6861 10.1103/RevModPhys.61.689
    • R. O. Jones and O. Gunnarson, Rev. Mod. Phys. RMPHAT 0034-6861 10.1103/RevModPhys.61.689 61, 689 (1989).
    • (1989) Rev. Mod. Phys. , vol.61 , pp. 689
    • Jones, R.O.1    Gunnarson, O.2
  • 40
    • 0001410220 scopus 로고
    • PRBMDO 1098-0121 10.1103/PhysRevB.37.6113
    • P. J. Jennings, R. O. Jones, and M. Weinert, Phys. Rev. B PRBMDO 1098-0121 10.1103/PhysRevB.37.6113 37, 6113 (1988).
    • (1988) Phys. Rev. B , vol.37 , pp. 6113
    • Jennings, P.J.1    Jones, R.O.2    Weinert, M.3
  • 44
    • 0037450228 scopus 로고    scopus 로고
    • ADVMEW 0935-9648 10.1002/adma.200390065
    • D. Cahen and A. Kahn, Adv. Mater. ADVMEW 0935-9648 10.1002/adma.200390065 15, 271 (2003).
    • (2003) Adv. Mater. , vol.15 , pp. 271
    • Cahen, D.1    Kahn, A.2
  • 46
    • 0002027187 scopus 로고    scopus 로고
    • Surface conditioning of chemical vapor deposited hexagonal boron nitride film for negative electron affinity
    • DOI 10.1063/1.123122, PII S0003695199041017
    • K. P. Loh, I. Sakaguchi, M. N. Gamo, S. Tagawa, T. Sugino, and T. Ando, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.123122 74, 28 (1999). (Pubitemid 129709954)
    • (1999) Applied Physics Letters , vol.74 , Issue.1 , pp. 28-30
    • Loh, K.P.1    Sakaguchi, I.2    Gamo, M.N.3    Tagawa, S.4    Sugino, T.5    Ando, T.6
  • 47
    • 0000664208 scopus 로고    scopus 로고
    • PRLTAO 0031-9007 10.1103/PhysRevLett.81.429
    • J. B. Cui, J. Ristein, and L. Ley, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.81.429 81, 429 (1998).
    • (1998) Phys. Rev. Lett. , vol.81 , pp. 429
    • Cui, J.B.1    Ristein, J.2    Ley, L.3
  • 48
    • 0001352040 scopus 로고    scopus 로고
    • PRBMDO 1098-0121 10.1103/PhysRevB.64.165411
    • F. Maier, J. Ristein, and L. Ley, Phys. Rev. B PRBMDO 1098-0121 10.1103/PhysRevB.64.165411 64, 165411 (2001).
    • (2001) Phys. Rev. B , vol.64 , pp. 165411
    • Maier, F.1    Ristein, J.2    Ley, L.3
  • 56
    • 0025400035 scopus 로고
    • JACTAW 0002-7820 10.1111/j.1151-2916.1990.tb06541.x
    • R. H. French, J. Am. Ceram. Soc. JACTAW 0002-7820 10.1111/j.1151-2916. 1990.tb06541.x 73, 477 (1990).
    • (1990) J. Am. Ceram. Soc. , vol.73 , pp. 477
    • French, R.H.1
  • 57
    • 0000028999 scopus 로고    scopus 로고
    • JAPIAU 0021-8979 10.1063/1.365667
    • Y. D. Glinka and M. Jaroniec, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.365667 82, 3499 (1997).
    • (1997) J. Appl. Phys. , vol.82 , pp. 3499
    • Glinka, Y.D.1    Jaroniec, M.2
  • 58
    • 0000359909 scopus 로고    scopus 로고
    • 2: A conduction-band mass reappraisal
    • DOI 10.1063/1.122133, PII S0003695198015356
    • R. Ludeke, H. J. Wen, and A. Schenk, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.122133 73, 1221 (1998). (Pubitemid 128671806)
    • (1998) Applied Physics Letters , vol.73 , Issue.9 , pp. 1221-1223
    • Ludeke, R.1    Wen, H.J.2    Schenk, A.3
  • 59
    • 79958799760 scopus 로고    scopus 로고
    • JAPIAU 0021-8979 10.1063/1.3587185
    • R. K. Chanana, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.3587185 109, 104508 (2011).
    • (2011) J. Appl. Phys. , vol.109 , pp. 104508
    • Chanana, R.K.1


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