Structural and optical characterization of SnS thin films by electrodeposition technique

Optica Applicata

Volumn 41, Issue 4, 2011, Pages 989-997

  Mariappan, R ^a   Ragavendar, M ^b   Ponnuswamy, V ^a  

^a SRI RAMAKRISHNA MISSION VIDYALAYA COLLEGE OF ARTS AND SCIENCE   (India)

^b RVS COLLEGE OF ENGINEERING AND TECHNOLOGY   (India)

Author keywords

Cathodic electrodeposition; SEM; Tin sulphide (SnS) thin films; X ray diffraction

Indexed keywords

CATHODIC ELECTRODEPOSITION; DIRECT BAND GAP; DISLOCATION DENSITIES; ELECTRODEPOSITION TECHNIQUE; FTIR; GLASS SUBSTRATES; ITO (INDIUM-TIN OXIDE); MICRO-STRAIN; MICROSTRUCTURAL PARAMETERS; OPTICAL CHARACTERIZATION; ORTHORHOMBIC CRYSTAL STRUCTURES; POLYCRYSTALLINE; SCANNING ELECTRON MICROSCOPES; SNS FILMS; SNS THIN FILMS; SPECTRAL RANGE; X-RAY DIFFRACTION STUDIES;

ELECTRODEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INDIUM COMPOUNDS; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SODIUM; SUBSTRATES; TIN; TIN OXIDES; X RAY DIFFRACTION;

THIN FILMS;

EID: 84857609750     PISSN: 00785466     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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