메뉴 건너뛰기




Volumn 520, Issue 9, 2012, Pages 3567-3573

Advantages of highly ionized pulse plasma magnetron sputtering (HIPIMS) of silver for improved E. coli inactivation

Author keywords

Direct Current Magnetron Sputtering; E. coli; High Impulse Power Magnetron Sputtering; Polyester; Silver; X ray Photoelectron Spectroscopy

Indexed keywords

ABSORPTION EDGES; DC MAGNETRON SPUTTERING; DIRECT CURRENT MAGNETRON SPUTTERING; E. COLI; E.COLI INACTIVATION; HIGHLY-IONIZED; PEAK DISCHARGE; POWER MAGNETRON; PULSE PLASMAS;

EID: 84857371886     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.12.060     Document Type: Article
Times cited : (29)

References (33)
  • 24
    • 0003828439 scopus 로고
    • 2nd Edition Auger and X-rays John Wiley & Sons Chichester, New York, Toronto, Singapore
    • D. Briggs, and M. Shea Practical Surface Analysis 2nd Edition Auger and X-rays v.1 1988 John Wiley & Sons Chichester, New York, Toronto, Singapore
    • (1988) Practical Surface Analysis , vol.1
    • Briggs, D.1    Shea, M.2
  • 27
    • 84857357991 scopus 로고
    • Academic Press New York
    • O.V. Krylov 1980 Academic Press New York 248
    • (1980) , pp. 248
    • Krylov, O.V.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.