Line defects, planar defects and voids in SrTiO 3 films grown on MgO by pulsed laser and pulsed laser interval deposition

Thin Solid Films

Volumn 520, Issue 9, 2012, Pages 3440-3447

  Tse, Y Y ^a   McMitchell, S R C ^b   Jackson, T J ^c   Jones, I P ^c   Genc, A ^d  

^a LOUGHBOROUGH UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF LIVERPOOL   (United Kingdom)

^c UNIVERSITY OF BIRMINGHAM   (United Kingdom)

^d The Ohio State University   (United States)

Author keywords

Defects; Pulsed laser deposition; Reflection high energy electron diffraction; Strontium titanate; Thin films; Transmission electron microscopy

Indexed keywords

ANTIPHASE BOUNDARIES; CRYSTAL SYSTEM; DEPOSITION METHODS; GROWTH DIRECTIONS; GROWTH MODES; HIGH RESOLUTION SCANNING; IN-PLANE; IN-SITU; LARGE LATTICE MISMATCH; LARGE STRAINS; LATTICE MISFITS; LAYER BY LAYER; LAYER-BY-LAYER GROWTH; LINE DEFECTS; MGO SUBSTRATE; MISFIT AND THREADING DISLOCATIONS; NANOHOLES; PLANAR DEFECT; SRTIO; THREE-DIMENSIONAL GROWTH; TRANSMISSION ELECTRON; TWO-DIMENSIONAL GROWTH;

DEFECTS; DEPOSITION; DISLOCATIONS (CRYSTALS); FILM GROWTH; INTERFACES (MATERIALS); MONOLAYERS; PULSED LASER DEPOSITION; PULSED LASERS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; STRONTIUM TITANATES; THIN FILMS; THREE DIMENSIONAL; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY;

SURFACE DEFECTS;

EID: 84857367867     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.12.033     Document Type: Article

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