Study of surface morphology and refractive index of dielectric and metallic films used for the fabrication of monolithically integrated surface plasmon resonance biosensing devices

Microelectronic Engineering

Volumn 93, Issue , 2012, Pages 91-94

  Jimenez, Alvaro ^a   Lepage, Dominic ^a   Beauvais, Jacques ^a   Dubowski, Jan J ^a  

^a UNIVERSITÉ DE SHERBROOKE   (Canada)

Author keywords

Biosensing; Dielectric thin films; Gold thin films; Plasmonic device fabrication; Surface plasmon resonance integrated device

Indexed keywords

BIOSENSING; DIELECTRIC THIN FILMS; GOLD THIN FILMS; PLASMONIC DEVICES; SURFACE PLASMON RESONANCE (SPR);

CHEMICAL VAPOR DEPOSITION; DEPOSITION RATES; DIELECTRIC MATERIALS; EQUIPMENT; FABRICATION; GOLD; INTELLIGENT VEHICLE HIGHWAY SYSTEMS; LITHOGRAPHY; MONOLITHIC INTEGRATED CIRCUITS; OPTIMIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICON COMPOUNDS; SURFACE MORPHOLOGY; THIN FILMS;

SURFACE PLASMON RESONANCE;

EID: 84857329593     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.10.016     Document Type: Article

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