Preparation and characterization of piezoelectric films of ZnO and AlN by RF sputtering for RF MEMS applications

Key Engineering Materials

Volumn 500, Issue , 2012, Pages 84-89

  Sudhir, Chandra ^a   Atul, Vir Singh ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

Aluminum nitride; Piezoelectric thin films; RF MEMS applications; Sputtering; Zinc oxide

Indexed keywords

ACOUSTIC SURFACE WAVE FILTERS; ALUMINUM NITRIDE; ANISOTROPIC ETCHING; II-VI SEMICONDUCTORS; III-V SEMICONDUCTORS; MAGNETRON SPUTTERING; MEMS; METALLIC FILMS; NITRIDES; OXIDE FILMS; PIEZOELECTRICITY; POTASSIUM HYDROXIDE; SILICA; SPUTTERING; THIN FILMS; ZINC OXIDE;

CRYSTALLOGRAPHIC ORIENTATIONS; FILM BULK ACOUSTIC RESONATORS; MICRO ELECTROMECHANICAL SYSTEM (MEMS); MICRO ELECTRO MECHANICAL SYSTEM; PIEZOELECTRIC THIN FILMS; POTASSIUM HYDROXIDE SOLUTION; RF-MEMS; X-RAY DIFFRACTION TECHNIQUES;

FILM PREPARATION;

EID: 84857188804     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/KEM.500.84     Document Type: Conference Paper

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